Picoseconds-Laser Modification of Thin Films
- Institute of Nuclear Sciences 'VINCA' 522, 11001 Belgrade (Serbia and Montenegro)
- Dipartimento di Fisica 'G. Occhialini', Universita' degli Studi Milano-Bicocca, Piazza della Scienza 3, Milan 20126 (Italy)
The interaction of a Nd:YAG laser, pulse duration of 40 ps, with a titanium nitride (TiN) and tungsten-titanium (W-Ti) thin films deposited at silicon was studied. The peak intensity on targets was up to 1012 W/cm2. Results have shown that the TiN surface was modified, by the laser beam, with energy density of {>=}0.18 J/cm2 ({lambda}laser= 532 nm) as well as of 30.0 J/cm2 ({lambda}laser= 1064 nm). The W-Ti was surface modified with energy density of 5.0 J/cm2 ({lambda}laser= 532 nm). The energy absorbed from the Nd:YAG laser beam is partially converted to thermal energy, which generates a series of effects such as melting, vaporization of molten materials, dissociation and ionization of the vaporized material, appearance of plasma, etc. The following morphological changes of both targets were observed: (i) The appearance of periodic microstructures, in the central zone of the irradiated area, for laser irradiation at 532 nm. Accumulation of great number of laser pulses caused film ablation and silicon modification. (ii) Hole formation on the titanium nitride/silicon target was registered at 1064 nm. The process of the Nd:YAG laser interaction with both targets was accompanied by plasma formation above the target.
- OSTI ID:
- 20798503
- Journal Information:
- AIP Conference Proceedings, Vol. 827, Issue 1; Conference: 3. international conference on superstrong fields in plasmas, Varenna (Italy), 19-24 Sep 2005; Other Information: DOI: 10.1063/1.2195249; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABLATION
ENERGY DENSITY
IONIZATION
IRRADIATION
LASER RADIATION
LASERS
MELTING
MICROSTRUCTURE
MODIFICATIONS
MORPHOLOGICAL CHANGES
PERIODICITY
PLASMA
PLASMA HEATING
PLASMA PRODUCTION
PULSES
SILICON
SURFACES
THIN FILMS
TITANIUM
TITANIUM NITRIDES
TUNGSTEN