13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources
Journal Article
·
· Journal of Applied Physics
- School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland)
An examination of the influence of target composition and viewing angle on the extreme ultraviolet spectra of laser produced plasmas formed from tin and tin doped planar targets is reported. Spectra have been recorded in the 9-17 nm region from plasmas created by a 700 mJ, 15 ns full width at half maximum intensity, 1064 nm Nd:YAG laser pulse using an absolutely calibrated 0.25 m grazing incidence vacuum spectrograph. The influence of absorption by tin ions (Sn I-Sn X) in the plasma is clearly seen in the shape of the peak feature at 13.5 nm, while the density of tin ions in the target is also seen to influence the level of radiation in the 9-17 nm region.
- OSTI ID:
- 20795786
- Journal Information:
- Journal of Applied Physics, Vol. 99, Issue 9; Other Information: DOI: 10.1063/1.2191477; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Simplified one-dimensional calculation of 13.5 nm emission in a tin plasma including radiation transport
Tin laser-produced plasma source modeling at 13.5 nm for extreme ultraviolet lithography
Angular emission and self-absorption studies of a tin laser produced plasma extreme ultraviolet source between 10 and 18 nm
Journal Article
·
Tue Dec 01 00:00:00 EST 2009
· Journal of Applied Physics
·
OSTI ID:20795786
+1 more
Tin laser-produced plasma source modeling at 13.5 nm for extreme ultraviolet lithography
Journal Article
·
Mon Apr 14 00:00:00 EDT 2008
· Applied Physics Letters
·
OSTI ID:20795786
+5 more
Angular emission and self-absorption studies of a tin laser produced plasma extreme ultraviolet source between 10 and 18 nm
Journal Article
·
Mon Jun 09 00:00:00 EDT 2008
· Applied Physics Letters
·
OSTI ID:20795786
+1 more