Densification of silica glass induced by 0.8 and 1.5 {mu}m intense femtosecond laser pulses

Journal Article · Mon May 01 00:00:00 EDT 2006 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2196237· OSTI ID:20795783

Saliminia, A; Nguyen, N T; Chin, S L; Vallee, R ^[1]

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1. Center for Optics, Photonics, and Laser (COPL), Laval University, Quebec G1K 7P4 (Canada)

We investigate the physical mechanisms responsible for waveguide formation in silica glass induced by 1 kHz intense femtosecond laser pulses from a Ti-sapphire laser at 0.8 {mu}m as well as from a femtosecond optical parametric amplifier at 1.5 {mu}m. It is demonstrated that the densification taking place at the irradiated region is the principal cause for refractive index change in the waveguides written with both 0.8 and 1.5 {mu}m pulses. The birefringence induced by the stress arising from such densification and its behavior against thermal annealing are also studied.

• OSTI ID: 20795783
• Journal Information: Journal of Applied Physics, Vol. 99, Issue 9; Other Information: DOI: 10.1063/1.2196237; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
BIREFRINGENCE
GLASS
IRRADIATION
LASERS
PARAMETRIC AMPLIFIERS
PULSES
REFRACTIVE INDEX
SAPPHIRE
SILICA
STRESSES
WAVEGUIDES