Synthesis and characterization of oriented graphitelike B-C-N hybrid

Journal Article · Sat Apr 15 00:00:00 EDT 2006 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2189008· OSTI ID:20788095

Uddin, Md Nizam; Shimoyama, Iwao; Baba, Yuji; Sekiguchi, Tetsuhiro; Nath, Krishna G; Nagano, Masamitsu ^[1]

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1. Surface Chemistry Research Group, Quantum Beam Science Directorate, Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki-ken 319-1195 (Japan)

In order to clarify the structure of graphitelike B-C-N hybrid thin films, borazine (B{sub 3}N{sub 3}H{sub 6}) ion plasma was implanted in highly oriented pyrolytic graphite at 800 deg. C and room temperature. The films were characterized in situ by x-ray photoelectron spectroscopy (XPS) and near-edge x-ray absorption fine structure (NEXAFS) using linearly polarized synchrotron radiation. The XPS study suggested that B atoms in the deposited films display in a wide variety of chemical bonds, e.g., B-C, B-N, and B-C-N. In the polarization-dependent NEXAFS spectra at the B K edge, the resonance peaks from B 1s to both {pi}*-like and {sigma}*-like orbitals are clearly observed, which suggest the existence of sp{sup 2} configuration around the boron atoms. On the basis of the graphitelike polarization dependencies observed in the B 1s{yields}{pi}* resonance peaks for B-C-N films deposited at 800 deg. C, we conclude that the highly oriented graphitelike B-C-N hybrids are stable at low boron content.

• OSTI ID: 20788095
• Journal Information: Journal of Applied Physics, Vol. 99, Issue 8; Other Information: DOI: 10.1063/1.2189008; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ABSORPTION
ABSORPTION SPECTROSCOPY
ATOMS
BORON
BORON COMPOUNDS
CARBON COMPOUNDS
CHEMICAL BONDS
FINE STRUCTURE
GRAPHITE
ION IMPLANTATION
PLASMA
POLARIZATION
RESONANCE
SYNCHROTRON RADIATION
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0273-0400 K
TEMPERATURE RANGE 1000-4000 K
THIN FILMS
X-RAY PHOTOELECTRON SPECTROSCOPY
X-RAY SPECTROSCOPY