Anomalous scaling behavior and surface roughening in molecular thin-film deposition

Yim, S; Jones, T S

doi:10.1103/PHYSREVB.73.1

Title: Anomalous scaling behavior and surface roughening in molecular thin-film deposition

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Abstract

The thin film growth dynamics of a molecular semiconductor, free-base phthalocyanine (H{sub 2}Pc), deposited by organic molecular beam deposition, has been studied by atomic force microscopy (AFM) and height difference correlation function (HDCF) analysis. The measured dynamic scaling components ({alpha}{sub loc}=0.61{+-}0.12, {beta}=1.02{+-}0.08, and 1/z=0.72{+-}0.13) are consistent with rapid surface roughening and anomalous scaling behavior. A detailed analysis of AFM images and simple growth models suggest that this behavior arises from the pronounced upward growth of crystalline H{sub 2}Pc mounds during the initial stages of thin film growth.

Authors:

Yim, S; Jones, T S ^[1]

Centre for Electronic Materials and Devices, Department of Chemistry, Imperial College London, London SW7 2AZ (United Kingdom)

Publication Date:: Sat Apr 15 00:00:00 EDT 2006

OSTI Identifier:: 20788075

Resource Type:: Journal Article

Journal Name:: Physical Review. B, Condensed Matter and Materials Physics

Additional Journal Information:: Journal Volume: 73; Journal Issue: 16; Other Information: DOI: 10.1103/PhysRevB.73.161305; (c) 2006 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1098-0121

Country of Publication:: United States

Language:: English

Subject:: 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ATOMIC FORCE MICROSCOPY; CORRELATION FUNCTIONS; CRYSTAL GROWTH; LAYERS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; ORGANIC SEMICONDUCTORS; PHTHALOCYANINES; ROUGHNESS; SURFACES; THIN FILMS

Citation Formats


                    Yim, S, and Jones, T S. Anomalous scaling behavior and surface roughening in molecular thin-film deposition.  United States: N. p., 2006. 
        Web.  doi:10.1103/PHYSREVB.73.1.

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                    Yim, S, & Jones, T S. Anomalous scaling behavior and surface roughening in molecular thin-film deposition.  United States.  https://doi.org/10.1103/PHYSREVB.73.1

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                    Yim, S, and Jones, T S. 2006.  
        "Anomalous scaling behavior and surface roughening in molecular thin-film deposition".  United States.  https://doi.org/10.1103/PHYSREVB.73.1.

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@article{osti_20788075,

  title        = {Anomalous scaling behavior and surface roughening in molecular thin-film deposition},

  author       = {Yim, S and Jones, T S},

  abstractNote = {The thin film growth dynamics of a molecular semiconductor, free-base phthalocyanine (H{sub 2}Pc), deposited by organic molecular beam deposition, has been studied by atomic force microscopy (AFM) and height difference correlation function (HDCF) analysis. The measured dynamic scaling components ({alpha}{sub loc}=0.61{+-}0.12, {beta}=1.02{+-}0.08, and 1/z=0.72{+-}0.13) are consistent with rapid surface roughening and anomalous scaling behavior. A detailed analysis of AFM images and simple growth models suggest that this behavior arises from the pronounced upward growth of crystalline H{sub 2}Pc mounds during the initial stages of thin film growth.},

  doi          = {10.1103/PHYSREVB.73.1},

  url          = {https://www.osti.gov/biblio/20788075},
  journal      = {Physical Review. B, Condensed Matter and Materials Physics},

  issn         = {1098-0121},

  number       = 16,

  volume       = 73,

  place        = {United States},

  year         = {Sat Apr 15 00:00:00 EDT 2006},

  month        = {Sat Apr 15 00:00:00 EDT 2006}

}

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