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Title: Anomalous scaling behavior and surface roughening in molecular thin-film deposition

Abstract

The thin film growth dynamics of a molecular semiconductor, free-base phthalocyanine (H{sub 2}Pc), deposited by organic molecular beam deposition, has been studied by atomic force microscopy (AFM) and height difference correlation function (HDCF) analysis. The measured dynamic scaling components ({alpha}{sub loc}=0.61{+-}0.12, {beta}=1.02{+-}0.08, and 1/z=0.72{+-}0.13) are consistent with rapid surface roughening and anomalous scaling behavior. A detailed analysis of AFM images and simple growth models suggest that this behavior arises from the pronounced upward growth of crystalline H{sub 2}Pc mounds during the initial stages of thin film growth.

Authors:
;  [1]
  1. Centre for Electronic Materials and Devices, Department of Chemistry, Imperial College London, London SW7 2AZ (United Kingdom)
Publication Date:
OSTI Identifier:
20788075
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physical Review. B, Condensed Matter and Materials Physics; Journal Volume: 73; Journal Issue: 16; Other Information: DOI: 10.1103/PhysRevB.73.161305; (c) 2006 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ATOMIC FORCE MICROSCOPY; CORRELATION FUNCTIONS; CRYSTAL GROWTH; LAYERS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; ORGANIC SEMICONDUCTORS; PHTHALOCYANINES; ROUGHNESS; SURFACES; THIN FILMS

Citation Formats

Yim, S., and Jones, T. S.. Anomalous scaling behavior and surface roughening in molecular thin-film deposition. United States: N. p., 2006. Web. doi:10.1103/PHYSREVB.73.1.
Yim, S., & Jones, T. S.. Anomalous scaling behavior and surface roughening in molecular thin-film deposition. United States. doi:10.1103/PHYSREVB.73.1.
Yim, S., and Jones, T. S.. Sat . "Anomalous scaling behavior and surface roughening in molecular thin-film deposition". United States. doi:10.1103/PHYSREVB.73.1.
@article{osti_20788075,
title = {Anomalous scaling behavior and surface roughening in molecular thin-film deposition},
author = {Yim, S. and Jones, T. S.},
abstractNote = {The thin film growth dynamics of a molecular semiconductor, free-base phthalocyanine (H{sub 2}Pc), deposited by organic molecular beam deposition, has been studied by atomic force microscopy (AFM) and height difference correlation function (HDCF) analysis. The measured dynamic scaling components ({alpha}{sub loc}=0.61{+-}0.12, {beta}=1.02{+-}0.08, and 1/z=0.72{+-}0.13) are consistent with rapid surface roughening and anomalous scaling behavior. A detailed analysis of AFM images and simple growth models suggest that this behavior arises from the pronounced upward growth of crystalline H{sub 2}Pc mounds during the initial stages of thin film growth.},
doi = {10.1103/PHYSREVB.73.1},
journal = {Physical Review. B, Condensed Matter and Materials Physics},
number = 16,
volume = 73,
place = {United States},
year = {Sat Apr 15 00:00:00 EDT 2006},
month = {Sat Apr 15 00:00:00 EDT 2006}
}
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