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Title: Ion debris characterization from a z-pinch extreme ultraviolet light source

Abstract

An XTREME Technologies XTS 13-35 extreme ultraviolet (EUV) light source creates a xenon z pinch that generates 13.5 nm light. Due to the near x-ray nature of light at this wavelength, extremely smooth metal mirrors for photon collection must be employed. These are exposed to the source debris. Dissolution of the z-pinch gas column results in high-energy ion and neutral release throughout the chamber that can have adverse effects on mirror surfaces. The XTREME commercial EUV emission diagnostic chamber was designed to maximize diagnostic access to the light and particulate emissions from the z pinch. The principal investigation is characterization of the debris field and the erosive effects on optics present. Light emission from the z pinch is followed by ejection of multiply charged ions and fast neutral particles that make up an erosive flux to chamber surfaces. Attenuation of this erosive flux to optical surfaces is attempted by inclusion of a debris mitigation tool consisting of foil traps and neutral buffer gas flow. Characterization of the z-pinch ejecta is performed with a spherical sector energy analyzer (ESA) that diagnoses fast ion species by energy-to-charge ratio using ion time-of-flight (ITOF) analysis. This is used to evaluate the debris tool's abilitymore » to divert direct fast ions from impact on optic surfaces. The ITOF-ESA is used to characterize both the energy and angular distribution of the direct fast ions. Xe{sup +} up to Xe{sup +4} ions have been characterized along with Ar{sup +} (the buffer gas used), W{sup +}, Mo{sup +}, Si{sup +}, Fe{sup +}, and Ni{sup +}. Energy spectra for these species from 0.5 up to 13 keV are defined at 20 deg. and 30 deg. from the pinch centerline in the chamber. Results show a drop in ion flux with angular increase. The dominant species is Xe{sup +} which peaks around 8 keV. Ion flux measured against buffer gas flow rate suggests that the direct fast ion population is significantly attenuated through increases in buffer gas flow rate. This does not address momentum transfer from scattered ions or fast neutral particles. These results are discussed in the context of other investigations on the effects of total particle flux to normal incidence mirror samples exposed for 1x10{sup 7} pulses. The samples (Si/Mo multilayer with Ru capping layer, Au, C, Mo, Pd, Ru, and Si) were exposed to the source plasma with 75% argon flow rate in the debris mitigation tool and surface metrology was performed using x-ray photoelectron spectroscopy, atomic force microscopy, x-ray reflectivity, and scanning electron microscopy to analyze erosion effects on mirrors. These results are compared to the measured direct ion debris field.« less

Authors:
; ; ; ; ;  [1]
  1. Plasma-Materials Interaction Group, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
Publication Date:
OSTI Identifier:
20787968
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 99; Journal Issue: 6; Other Information: DOI: 10.1063/1.2175471; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ARGON; ARGON IONS; ATOMIC FORCE MICROSCOPY; ENERGY SPECTRA; EXTREME ULTRAVIOLET RADIATION; FLOW RATE; GAS FLOW; INDIUM IONS; IRON IONS; LIGHT SOURCES; MOLYBDENUM IONS; MOMENTUM TRANSFER; NEUTRAL PARTICLES; NICKEL IONS; SCANNING ELECTRON MICROSCOPY; TIME-OF-FLIGHT METHOD; TUNGSTEN IONS; WALL EFFECTS; X-RAY PHOTOELECTRON SPECTROSCOPY; XENON IONS

Citation Formats

Antonsen, Erik L., Thompson, Keith C., Hendricks, Matthew R., Alman, Darren A., Jurczyk, Brian E., and Ruzic, D.N. Ion debris characterization from a z-pinch extreme ultraviolet light source. United States: N. p., 2006. Web. doi:10.1063/1.2175471.
Antonsen, Erik L., Thompson, Keith C., Hendricks, Matthew R., Alman, Darren A., Jurczyk, Brian E., & Ruzic, D.N. Ion debris characterization from a z-pinch extreme ultraviolet light source. United States. doi:10.1063/1.2175471.
Antonsen, Erik L., Thompson, Keith C., Hendricks, Matthew R., Alman, Darren A., Jurczyk, Brian E., and Ruzic, D.N. Wed . "Ion debris characterization from a z-pinch extreme ultraviolet light source". United States. doi:10.1063/1.2175471.
@article{osti_20787968,
title = {Ion debris characterization from a z-pinch extreme ultraviolet light source},
author = {Antonsen, Erik L. and Thompson, Keith C. and Hendricks, Matthew R. and Alman, Darren A. and Jurczyk, Brian E. and Ruzic, D.N.},
abstractNote = {An XTREME Technologies XTS 13-35 extreme ultraviolet (EUV) light source creates a xenon z pinch that generates 13.5 nm light. Due to the near x-ray nature of light at this wavelength, extremely smooth metal mirrors for photon collection must be employed. These are exposed to the source debris. Dissolution of the z-pinch gas column results in high-energy ion and neutral release throughout the chamber that can have adverse effects on mirror surfaces. The XTREME commercial EUV emission diagnostic chamber was designed to maximize diagnostic access to the light and particulate emissions from the z pinch. The principal investigation is characterization of the debris field and the erosive effects on optics present. Light emission from the z pinch is followed by ejection of multiply charged ions and fast neutral particles that make up an erosive flux to chamber surfaces. Attenuation of this erosive flux to optical surfaces is attempted by inclusion of a debris mitigation tool consisting of foil traps and neutral buffer gas flow. Characterization of the z-pinch ejecta is performed with a spherical sector energy analyzer (ESA) that diagnoses fast ion species by energy-to-charge ratio using ion time-of-flight (ITOF) analysis. This is used to evaluate the debris tool's ability to divert direct fast ions from impact on optic surfaces. The ITOF-ESA is used to characterize both the energy and angular distribution of the direct fast ions. Xe{sup +} up to Xe{sup +4} ions have been characterized along with Ar{sup +} (the buffer gas used), W{sup +}, Mo{sup +}, Si{sup +}, Fe{sup +}, and Ni{sup +}. Energy spectra for these species from 0.5 up to 13 keV are defined at 20 deg. and 30 deg. from the pinch centerline in the chamber. Results show a drop in ion flux with angular increase. The dominant species is Xe{sup +} which peaks around 8 keV. Ion flux measured against buffer gas flow rate suggests that the direct fast ion population is significantly attenuated through increases in buffer gas flow rate. This does not address momentum transfer from scattered ions or fast neutral particles. These results are discussed in the context of other investigations on the effects of total particle flux to normal incidence mirror samples exposed for 1x10{sup 7} pulses. The samples (Si/Mo multilayer with Ru capping layer, Au, C, Mo, Pd, Ru, and Si) were exposed to the source plasma with 75% argon flow rate in the debris mitigation tool and surface metrology was performed using x-ray photoelectron spectroscopy, atomic force microscopy, x-ray reflectivity, and scanning electron microscopy to analyze erosion effects on mirrors. These results are compared to the measured direct ion debris field.},
doi = {10.1063/1.2175471},
journal = {Journal of Applied Physics},
number = 6,
volume = 99,
place = {United States},
year = {Wed Mar 15 00:00:00 EST 2006},
month = {Wed Mar 15 00:00:00 EST 2006}
}