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Title: Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator

Abstract

Extreme-ultraviolet (EUV) lithography remains a leading contender for use in the mass production of nanoelectronics at the 32 nm node. Great progress has been made in all areas of EUV lithography, including the crucial issue of fabrication of diffraction-limited optics. To gain an accurate understanding of the projection optic wavefront error in a completed lithography tool requires lithography-based aberration measurements; however, making such measurements in EUV systems can be challenging. We describe the quantitative lithographic measurement of spherical aberration in a 0.3 numerical aperture. EUV microfield optic. The measurement method is based on use of the unique properties of a programmable coherence illuminator. The results show the optic to have 1 nm rms spherical error, whereas interferometric measurements performed during the alignment of the optic indicated a spherical error of less than 0.1 nm rms.

Authors:
; ;
Publication Date:
OSTI Identifier:
20779283
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Optics; Journal Volume: 45; Journal Issue: 9; Other Information: DOI: 10.1364/AO.45.001957; (c) 2006 Optical Society of America; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; APERTURES; DIFFRACTION; ERRORS; EXTREME ULTRAVIOLET RADIATION; GEOMETRICAL ABERRATIONS; OPTICS; SYNCHROTRON RADIATION

Citation Formats

Naulleau, Patrick P., Cain, Jason P., and Goldberg, Kenneth A. Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator. United States: N. p., 2006. Web. doi:10.1364/AO.45.0.
Naulleau, Patrick P., Cain, Jason P., & Goldberg, Kenneth A. Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator. United States. doi:10.1364/AO.45.0.
Naulleau, Patrick P., Cain, Jason P., and Goldberg, Kenneth A. Mon . "Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator". United States. doi:10.1364/AO.45.0.
@article{osti_20779283,
title = {Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator},
author = {Naulleau, Patrick P. and Cain, Jason P. and Goldberg, Kenneth A},
abstractNote = {Extreme-ultraviolet (EUV) lithography remains a leading contender for use in the mass production of nanoelectronics at the 32 nm node. Great progress has been made in all areas of EUV lithography, including the crucial issue of fabrication of diffraction-limited optics. To gain an accurate understanding of the projection optic wavefront error in a completed lithography tool requires lithography-based aberration measurements; however, making such measurements in EUV systems can be challenging. We describe the quantitative lithographic measurement of spherical aberration in a 0.3 numerical aperture. EUV microfield optic. The measurement method is based on use of the unique properties of a programmable coherence illuminator. The results show the optic to have 1 nm rms spherical error, whereas interferometric measurements performed during the alignment of the optic indicated a spherical error of less than 0.1 nm rms.},
doi = {10.1364/AO.45.0},
journal = {Applied Optics},
number = 9,
volume = 45,
place = {United States},
year = {Mon Mar 20 00:00:00 EST 2006},
month = {Mon Mar 20 00:00:00 EST 2006}
}