Surface stress control using ultraviolet light irradiation of plasma-polymerized thin films

Journal Article · Mon Apr 03 00:00:00 EDT 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2183807· OSTI ID:20779168

Igarashi, Shinichi; Itakura, Akiko N; Kitajima, Masahiro; Chifen, Anye N; Foerch, Renate; Berger, Ruediger ^[1]

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1. National Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047 (Japan) and Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi 332-0012 (Japan)

We investigated the surface stress change of plasma-polymerized allylamine films on 2 {mu}m thick silicon micromechanical cantilever substrates induced by ultraviolet light (UV) irradiation. Compressive surface stress was generated during the UV irradiation of the plasma-polymerized films in a dry environment, whereas tensile stress was measured in a humid environment. Fourier transform infrared spectroscopic analysis indicated two mechanisms taking place depending on the environmental conditions. These were attributed to crosslinking and oxidation reactions of the plasma polymer. UV irradiation of plasma polymerized allylamine films at defined humidity suggests a feasible method for achieving tensile and compressive surface stress patterning.

• OSTI ID: 20779168
• Journal Information: Applied Physics Letters, Vol. 88, Issue 14; Other Information: DOI: 10.1063/1.2183807; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COMPRESSION STRENGTH
CROSS-LINKING
FOURIER TRANSFORM SPECTROMETERS
HUMIDITY
INFRARED SPECTRA
IRRADIATION
OXIDATION
PLASMA
POLYMERS
SILICON
STRESSES
SUBSTRATES
SURFACE PROPERTIES
TENSILE PROPERTIES
THIN FILMS
ULTRAVIOLET RADIATION