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Title: High-temperature stability multilayers for extreme-ultraviolet condenser optics

Abstract

We investigate the thermal stability of Mo/SiC multilayer coatings at elevated temperatures. Transmission electron microscopy and x-ray diffraction studies show that, upon annealing, a thermally induced structural relaxation occurs that transforms the polycrystalline Mo and amorphous SiC layers in as-deposited multilayers into an amorphous Mo-Si-C alloy and crystalline SiC, respectively. After this relaxation process is complete, the multilayer is stable at temperatures up to 400 deg. C.

Authors:
;
Publication Date:
OSTI Identifier:
20779117
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Optics; Journal Volume: 44; Journal Issue: 36; Other Information: DOI: 10.1364/AO.44.007735; (c) 2005 Optical Society of America; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANNEALING; CARBON ADDITIONS; COATINGS; EXTREME ULTRAVIOLET RADIATION; LAYERS; MIRRORS; MOLYBDENUM; MOLYBDENUM ALLOYS; OPTICAL PROPERTIES; OPTICS; POLYCRYSTALS; SILICON ALLOYS; SILICON CARBIDES; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION

Citation Formats

Bajt, Sasa, and Stearns, Daniel G. High-temperature stability multilayers for extreme-ultraviolet condenser optics. United States: N. p., 2005. Web. doi:10.1364/AO.44.0.
Bajt, Sasa, & Stearns, Daniel G. High-temperature stability multilayers for extreme-ultraviolet condenser optics. United States. doi:10.1364/AO.44.0.
Bajt, Sasa, and Stearns, Daniel G. Tue . "High-temperature stability multilayers for extreme-ultraviolet condenser optics". United States. doi:10.1364/AO.44.0.
@article{osti_20779117,
title = {High-temperature stability multilayers for extreme-ultraviolet condenser optics},
author = {Bajt, Sasa and Stearns, Daniel G},
abstractNote = {We investigate the thermal stability of Mo/SiC multilayer coatings at elevated temperatures. Transmission electron microscopy and x-ray diffraction studies show that, upon annealing, a thermally induced structural relaxation occurs that transforms the polycrystalline Mo and amorphous SiC layers in as-deposited multilayers into an amorphous Mo-Si-C alloy and crystalline SiC, respectively. After this relaxation process is complete, the multilayer is stable at temperatures up to 400 deg. C.},
doi = {10.1364/AO.44.0},
journal = {Applied Optics},
number = 36,
volume = 44,
place = {United States},
year = {Tue Dec 20 00:00:00 EST 2005},
month = {Tue Dec 20 00:00:00 EST 2005}
}
  • We investigate the thermal stability of Mo/SiC multilayer coatings at elevated temperatures. Transmission electron microscopy and x-ray diffraction studies show that upon annealing a thermally-induced structural relaxation occurs that transforms the polycrystalline Mo and amorphous SiC layers in as-deposited multilayers into amorphous Mo-Si-C alloy and crystalline SiC, respectively. After this relaxation process is complete the multilayer is stable at temperatures up to 400 C.
  • New extreme ultraviolet (EUV) spectroscopic diagnostics of relatively low-temperature plasmas based on the application of an EUV spectrometer and fast EUV diodes combined with glass capillary optics is described. An advanced high resolution dispersive element sliced multilayer grating was used in the compact EUV spectrometer. For monitoring of the time history of radiation, filtered fast EUV diodes were used in the same spectral region (>13 nm) as the EUV spectrometer. The radiation from the plasma was captured by using a single inexpensive glass capillary that was transported onto the spectrometer entrance slit and EUV diode. The use of glass capillarymore » optics allowed placement of the spectrometer and diodes behind the thick radiation shield outside the direction of a possible hard x-ray radiation beam and debris from the plasma source. The results of the testing and application of this diagnostic for a compact laser plasma source are presented. Examples of modeling with parameters of plasmas are discussed.« less
  • Asymmetric scattering of extreme ultraviolet light is observed from Mo/Si multilayers at normal incidence. The observed asymmetry is shown to depend on the geometry of the multilayer film deposition. However, atomic force microscopy (AFM) measurements of the top surface were isotropic, and there was no indication of columnar film growth either in the AFM or in TEM cross-sectional measurements. The scattering asymmetry is instead found to result from a skewed propagation of roughness within the multilayer. A modified film growth model is developed which describes this, and is also used to calculate the nonspecular scattering. The results of the modelmore » are in excellent agreement with the measurements. The scattering asymmetry can be used to determine the average deposition angle during the film growth. {copyright} {ital 1999} {ital The American Physical Society}« less
  • We report on the growth of low defect density Mo/Si multilayer (ML) coatings. The coatings were grown in a deposition system specifically designed for extreme ultraviolet lithography mask blank fabrication. Complete, 81 layer, high reflectance Mo/Si ML coatings were deposited on 150 mm diam (100) oriented Si wafer substrates using ion beam sputter deposition. Process added defect densities correspond to 2{times}10{sup {minus}2}/cm{sup {minus}2} larger than 0.13 {mu}m as measured by optical scattering. This represents a reduction in defect density of Mo/Si ML coatings by a factor of 10{sup 5}. {copyright} {ital 1997 American Vacuum Society.}
  • No abstract prepared.