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Title: Patterning of silica microsphere monolayers with focused femtosecond laser pulses

Abstract

We demonstrate the patterning of monolayer silica microsphere lattices with tightly focused femtosecond laser pulses. We selectively removed microspheres from a lattice and characterized the effect on the lattice and the substrate. The proposed physical mechanism for the patterning process is laser-induced breakdown followed by ablation of material. We show that a microsphere focuses radiation in its interior and in the near field. This effect plays an important role in the patterning process by enhancing resolution and accuracy and by reducing the pulse energy threshold for damage. Microsphere patterning could create controlled defects within self-assembled opal photonic crystals.

Authors:
;  [1];  [2]
  1. Department of Physics, University of Colorado, Boulder, Colorado 80309-0390 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
20778812
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 88; Journal Issue: 11; Other Information: DOI: 10.1063/1.2183733; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ABLATION; BREAKDOWN; CRYSTALS; DAMAGE; FOCUSING; LASERS; MICROSPHERES; OPALS; PULSES; RESOLUTION; SILICON COMPOUNDS; SUBSTRATES

Citation Formats

Cai Wenjian, Piestun, Rafael, and Department of Electrical and Computer Engineering, University of Colorado, Boulder, Colorado 80309-0425. Patterning of silica microsphere monolayers with focused femtosecond laser pulses. United States: N. p., 2006. Web. doi:10.1063/1.2183733.
Cai Wenjian, Piestun, Rafael, & Department of Electrical and Computer Engineering, University of Colorado, Boulder, Colorado 80309-0425. Patterning of silica microsphere monolayers with focused femtosecond laser pulses. United States. doi:10.1063/1.2183733.
Cai Wenjian, Piestun, Rafael, and Department of Electrical and Computer Engineering, University of Colorado, Boulder, Colorado 80309-0425. Mon . "Patterning of silica microsphere monolayers with focused femtosecond laser pulses". United States. doi:10.1063/1.2183733.
@article{osti_20778812,
title = {Patterning of silica microsphere monolayers with focused femtosecond laser pulses},
author = {Cai Wenjian and Piestun, Rafael and Department of Electrical and Computer Engineering, University of Colorado, Boulder, Colorado 80309-0425},
abstractNote = {We demonstrate the patterning of monolayer silica microsphere lattices with tightly focused femtosecond laser pulses. We selectively removed microspheres from a lattice and characterized the effect on the lattice and the substrate. The proposed physical mechanism for the patterning process is laser-induced breakdown followed by ablation of material. We show that a microsphere focuses radiation in its interior and in the near field. This effect plays an important role in the patterning process by enhancing resolution and accuracy and by reducing the pulse energy threshold for damage. Microsphere patterning could create controlled defects within self-assembled opal photonic crystals.},
doi = {10.1063/1.2183733},
journal = {Applied Physics Letters},
number = 11,
volume = 88,
place = {United States},
year = {Mon Mar 13 00:00:00 EST 2006},
month = {Mon Mar 13 00:00:00 EST 2006}
}