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Title: In situ epitaxial growth of TiO{sub 2} on RuO{sub 2} nanorods with reactive sputtering

Abstract

In this work, TiO{sub 2} deposition on RuO{sub 2} nanorods with reactive sputtering was studied. The TiO{sub 2} deposition was performed in situ after the RuO{sub 2} nanorod deposition at the same substrate temperature of 450 deg. C. The morphology examination and structure analysis have indicated a uniform and pure rutile TiO{sub 2} deposition on RuO{sub 2} nanorods. High-resolution transmission electron microscopy images also revealed an epitaxial growth of TiO{sub 2} on RuO{sub 2} nanorods. Such a low-temperature fabrication technique for one-dimensional (1D) heteronanostructure may apply to other functional materials. Since RuO{sub 2} is a good electric conductor, 1D heteronanostructures made from RuO{sub 2} nanorods are expected to exhibit enhanced functionality particularly in electrical and electrochemical applications.

Authors:
; ; ; ; ; ; ;  [1]
  1. Department of Materials Science and Engineering, National Tsing-Hua University, Hsinchu City 30043, Taiwan (China)
Publication Date:
OSTI Identifier:
20778581
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 88; Journal Issue: 4; Other Information: DOI: 10.1063/1.2166481; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; DEPOSITION; ELECTRIC CONDUCTORS; MORPHOLOGY; NANOSTRUCTURES; RUTHENIUM OXIDES; RUTILE; SPUTTERING; SUBSTRATES; TEMPERATURE RANGE 0400-1000 K; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; VAPOR PHASE EPITAXY

Citation Formats

Cheng, K.-W., Lin, Y.-T., Chen, C.-Y., Hsiung, C.-P., Gan, J.-Y., Yeh, J.-W., Hsieh, C.-H., and Chou, L.-J. In situ epitaxial growth of TiO{sub 2} on RuO{sub 2} nanorods with reactive sputtering. United States: N. p., 2006. Web. doi:10.1063/1.2166481.
Cheng, K.-W., Lin, Y.-T., Chen, C.-Y., Hsiung, C.-P., Gan, J.-Y., Yeh, J.-W., Hsieh, C.-H., & Chou, L.-J. In situ epitaxial growth of TiO{sub 2} on RuO{sub 2} nanorods with reactive sputtering. United States. doi:10.1063/1.2166481.
Cheng, K.-W., Lin, Y.-T., Chen, C.-Y., Hsiung, C.-P., Gan, J.-Y., Yeh, J.-W., Hsieh, C.-H., and Chou, L.-J. Mon . "In situ epitaxial growth of TiO{sub 2} on RuO{sub 2} nanorods with reactive sputtering". United States. doi:10.1063/1.2166481.
@article{osti_20778581,
title = {In situ epitaxial growth of TiO{sub 2} on RuO{sub 2} nanorods with reactive sputtering},
author = {Cheng, K.-W. and Lin, Y.-T. and Chen, C.-Y. and Hsiung, C.-P. and Gan, J.-Y. and Yeh, J.-W. and Hsieh, C.-H. and Chou, L.-J.},
abstractNote = {In this work, TiO{sub 2} deposition on RuO{sub 2} nanorods with reactive sputtering was studied. The TiO{sub 2} deposition was performed in situ after the RuO{sub 2} nanorod deposition at the same substrate temperature of 450 deg. C. The morphology examination and structure analysis have indicated a uniform and pure rutile TiO{sub 2} deposition on RuO{sub 2} nanorods. High-resolution transmission electron microscopy images also revealed an epitaxial growth of TiO{sub 2} on RuO{sub 2} nanorods. Such a low-temperature fabrication technique for one-dimensional (1D) heteronanostructure may apply to other functional materials. Since RuO{sub 2} is a good electric conductor, 1D heteronanostructures made from RuO{sub 2} nanorods are expected to exhibit enhanced functionality particularly in electrical and electrochemical applications.},
doi = {10.1063/1.2166481},
journal = {Applied Physics Letters},
number = 4,
volume = 88,
place = {United States},
year = {Mon Jan 23 00:00:00 EST 2006},
month = {Mon Jan 23 00:00:00 EST 2006}
}