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Title: A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis

Abstract

A low-power wavelength dispersive x-ray fluorescence (WDXRF) system with a spatial resolution of 25 {mu}m has been built to measure thin-film thickness. By using advanced x-ray optics and a 50-W air-cooled x-ray tube, the system achieved a detection limit equivalent to that of a conventional WDXRF system that employs a 4-kW x-ray tube and a spatial resolution of 10 mm in diameter. For a 25-nm-thick tantalum underlayer, a detection limit of 0.18 nm was achieved and measurement precision of 2% was obtained with a measurement time of 100 s.

Authors:
; ;  [1];  [2]
  1. X-Ray Optical Systems, Inc., East Greenbush, New York 12061 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
20778479
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 76; Journal Issue: 12; Other Information: DOI: 10.1063/1.2140448; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ACCURACY; FLUORESCENCE; FOCUSING; OPTICS; SENSITIVITY; SPATIAL RESOLUTION; TANTALUM; THICKNESS; THIN FILMS; WAVELENGTHS; X RADIATION; X-RAY FLUORESCENCE ANALYSIS; X-RAY TUBES

Citation Formats

Gao Ning, Chen Zewu, Xiao Qifan, and Hitachi Global Storage Technologies, Inc., San Jose, California 95193. A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis. United States: N. p., 2005. Web. doi:10.1063/1.2140448.
Gao Ning, Chen Zewu, Xiao Qifan, & Hitachi Global Storage Technologies, Inc., San Jose, California 95193. A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis. United States. doi:10.1063/1.2140448.
Gao Ning, Chen Zewu, Xiao Qifan, and Hitachi Global Storage Technologies, Inc., San Jose, California 95193. Thu . "A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis". United States. doi:10.1063/1.2140448.
@article{osti_20778479,
title = {A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis},
author = {Gao Ning and Chen Zewu and Xiao Qifan and Hitachi Global Storage Technologies, Inc., San Jose, California 95193},
abstractNote = {A low-power wavelength dispersive x-ray fluorescence (WDXRF) system with a spatial resolution of 25 {mu}m has been built to measure thin-film thickness. By using advanced x-ray optics and a 50-W air-cooled x-ray tube, the system achieved a detection limit equivalent to that of a conventional WDXRF system that employs a 4-kW x-ray tube and a spatial resolution of 10 mm in diameter. For a 25-nm-thick tantalum underlayer, a detection limit of 0.18 nm was achieved and measurement precision of 2% was obtained with a measurement time of 100 s.},
doi = {10.1063/1.2140448},
journal = {Review of Scientific Instruments},
number = 12,
volume = 76,
place = {United States},
year = {Thu Dec 15 00:00:00 EST 2005},
month = {Thu Dec 15 00:00:00 EST 2005}
}
  • A rapid method for the determination of 16 elements in tobacco by wavelength dispersive X-ray fluorescence spectrometry has been developed. The method is accurate and precise, and requires only 9 min per sample for quantitation. Sample preparation consists of placing a portion of dried, ground tobacco in a sample cup, and pressing at 25 tons pressure to make a compressed pellet. This pellet is then automatically analyzed by X-ray fluorescence for 16 elements. The results are stored on a computer disk for future recall and report generation. The elements are: Al, Br, Ca, Cl, Cu, Fe, K, Mg, Mn, Na,more » P, S, Si, Sr, Ti and Zn.« less
  • An apparatus for angle-resolved, wavelength-dispersive x-ray fluorescence spectroscopy with synchrotron radiation has been built and tested at the beam line BN2 of the Bonn electron stretcher and accelerator (ELSA). The apparatus is to be used for nondestructive depth profile analysis of ion-implanted semiconductors as part of the multinational Versailles Project of Advanced Materials and Standards (VAMAS) project on ion-implanted reference materials. In particular, the centroid depths of depth profiles of various implants is to be determined by use of the angle-resolved signal ratio technique. First results of measurements on implants of phosphorus (100 keV, 10{sup 16} cm{sup {minus}2}) and sulfurmore » (200 keV, 10{sup 14} cm{sup {minus}2}) in silicon wafers using white'' synchrotron radiation are presented and suggest that it should be generally possible to measure the centroid depth of an implant at dose densities as low as 10{sup 14} cm{sup {minus}2}. Some of the apparative and technical requirements are discussed which are peculiar to the use of synchrotron radiation in general and to the use of nonmonochromatized radiation in particular.« less
  • The objective of this study was to combine the results from SXRF and EDX to provide information about the elemental composition of individual groundwater colloids and about the identity of contaminants associated with these colloids. Because the contaminant metals in the study site came from a point source, their presence on groundwater colloids would provide elemental signatures suggesting that colloids may be important in contaminant transport. SXRF was used to detect low concentrations of contaminant metals associated with surfaces of clusters of groundwater colloids. EDX was used to detect the more abundant elements (including the geochemically important, lower atomic numbermore » elements Al and Si that are insensitive to SXRF) associated with surfaces of individual colloids. These techniques were also selected because they require only a small sample mass, about 0.01 g, which may be the total quantity of colloids recovered from 24 h of groundwater sampling. The study site was an aquifer underlying unlined seepage basins that had received wastewater containing sodium hydroxide, nitric acid, radionuclides, and numerous metals from a nuclear materials processing facility on the Savannah River Site near Aiken, SC. 12 refs., 2 figs., 2 tabs.« less
  • X-ray fluorescence analysis using a synchrotron x-ray microprobe has become an indispensable technique for non-destructive micro-analysis. One of the most important parameters that characterize the x-ray microbeam system for x-ray fluorescence analysis is the beam size. For practical analysis, however, the photon flux, the energy resolution and the available energy range are also crucial. Three types of x-ray microbeam systems, including monochromatic and continuum excitation systems, were compared with reference to the sensitivity, the minimum detection limit and the applicability to various types of x-ray spectroscopic analysis. 16 refs., 5 figs.