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Title: A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis

Abstract

A low-power wavelength dispersive x-ray fluorescence (WDXRF) system with a spatial resolution of 25 {mu}m has been built to measure thin-film thickness. By using advanced x-ray optics and a 50-W air-cooled x-ray tube, the system achieved a detection limit equivalent to that of a conventional WDXRF system that employs a 4-kW x-ray tube and a spatial resolution of 10 mm in diameter. For a 25-nm-thick tantalum underlayer, a detection limit of 0.18 nm was achieved and measurement precision of 2% was obtained with a measurement time of 100 s.

Authors:
; ;  [1];  [2]
  1. X-Ray Optical Systems, Inc., East Greenbush, New York 12061 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
20778479
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 76; Journal Issue: 12; Other Information: DOI: 10.1063/1.2140448; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ACCURACY; FLUORESCENCE; FOCUSING; OPTICS; SENSITIVITY; SPATIAL RESOLUTION; TANTALUM; THICKNESS; THIN FILMS; WAVELENGTHS; X RADIATION; X-RAY FLUORESCENCE ANALYSIS; X-RAY TUBES

Citation Formats

Gao Ning, Chen Zewu, Xiao Qifan, and Hitachi Global Storage Technologies, Inc., San Jose, California 95193. A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis. United States: N. p., 2005. Web. doi:10.1063/1.2140448.
Gao Ning, Chen Zewu, Xiao Qifan, & Hitachi Global Storage Technologies, Inc., San Jose, California 95193. A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis. United States. doi:10.1063/1.2140448.
Gao Ning, Chen Zewu, Xiao Qifan, and Hitachi Global Storage Technologies, Inc., San Jose, California 95193. Thu . "A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis". United States. doi:10.1063/1.2140448.
@article{osti_20778479,
title = {A microbeam wavelength-dispersive x-ray fluorescence system and its application for thin-film analysis},
author = {Gao Ning and Chen Zewu and Xiao Qifan and Hitachi Global Storage Technologies, Inc., San Jose, California 95193},
abstractNote = {A low-power wavelength dispersive x-ray fluorescence (WDXRF) system with a spatial resolution of 25 {mu}m has been built to measure thin-film thickness. By using advanced x-ray optics and a 50-W air-cooled x-ray tube, the system achieved a detection limit equivalent to that of a conventional WDXRF system that employs a 4-kW x-ray tube and a spatial resolution of 10 mm in diameter. For a 25-nm-thick tantalum underlayer, a detection limit of 0.18 nm was achieved and measurement precision of 2% was obtained with a measurement time of 100 s.},
doi = {10.1063/1.2140448},
journal = {Review of Scientific Instruments},
number = 12,
volume = 76,
place = {United States},
year = {Thu Dec 15 00:00:00 EST 2005},
month = {Thu Dec 15 00:00:00 EST 2005}
}