Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation

doi:10.1063/1.2134600

Title: Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation

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Abstract

A self-consistent 1D fluid model is used to investigate the formation, growth and transport mechanisms of sub-micrometer particles in a low pressure capacitively coupled radio-frequency silane (SiH4) discharge. In this contribution we analyze the competition between the different forces governing the transport of nanometer-sized particles and the specific role of the thermophoretic force arising from a thermal gradient in gas temperature induced by heating or cooling of the electrodes. Further growth of the nanoparticles due to coagulation is also described by coupling the 1D fluid model with an aerosol dynamics model.

Authors:

Bleecker, K. de; Bogaerts, A. ^[1]; Goedheer, W.J. ^[2]

PLASMANT, Dept. of Chemistry, University of Antwerp (Ukraine), Universiteitsplein 1, 2610 Wilrijk (Belgium)
FOM Institute for Plasma Physics 'Rijnhuizen', Association EURATOM-FOM, Trilateral Euregio Cluster, P.O. Box 1207, 3430 BE Nieuwegein (Netherlands)

Publication Date:: Mon Oct 31 00:00:00 EST 2005

OSTI Identifier:: 20726747

Resource Type:: Journal Article

Resource Relation:: Journal Name: AIP Conference Proceedings; Journal Volume: 799; Journal Issue: 1; Conference: 4. international conference on the physics of dusty plasmas, Orleans (France), 13-17 Jun 2005; Other Information: DOI: 10.1063/1.2134600; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)

Country of Publication:: United States

Language:: English

Subject:: 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; AEROSOLS; ELECTRODES; FLUIDS; HIGH-FREQUENCY DISCHARGES; NANOSTRUCTURES; NUMERICAL ANALYSIS; PARTICLES; PLASMA; PLASMA SIMULATION; RADIOWAVE RADIATION; SILANES; TEMPERATURE GRADIENTS

Citation Formats


                    Bleecker, K. de, Bogaerts, A., and Goedheer, W.J.. Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation.  United States: N. p., 2005. 
        Web.  doi:10.1063/1.2134600.

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                    Bleecker, K. de, Bogaerts, A., & Goedheer, W.J.. Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation.  United States.  doi:10.1063/1.2134600.

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                    Bleecker, K. de, Bogaerts, A., and Goedheer, W.J.. Mon .  
        "Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation".  United States.  
        doi:10.1063/1.2134600.

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@article{osti_20726747,

  title        = {Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation},

  author       = {Bleecker, K. de and Bogaerts, A. and Goedheer, W.J.},

  abstractNote = {A self-consistent 1D fluid model is used to investigate the formation, growth and transport mechanisms of sub-micrometer particles in a low pressure capacitively coupled radio-frequency silane (SiH4) discharge. In this contribution we analyze the competition between the different forces governing the transport of nanometer-sized particles and the specific role of the thermophoretic force arising from a thermal gradient in gas temperature induced by heating or cooling of the electrodes. Further growth of the nanoparticles due to coagulation is also described by coupling the 1D fluid model with an aerosol dynamics model.},

  doi          = {10.1063/1.2134600},

  journal      = {AIP Conference Proceedings},

  number       = 1,

  volume       = 799,

  place        = {United States},

  year         = {Mon Oct 31 00:00:00 EST 2005},

  month        = {Mon Oct 31 00:00:00 EST 2005}

}

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DOI: 10.1063/1.2134600

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