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Title: Quantitative analysis of sputter processes in a small magnetron system

Abstract

Sputter deposition of titanium in argon from a small circular magnetron is characterized. The dependence of the deposition rate on pressure, power, and target-substrate distance has been measured. A framework for the application of the analytic approach by Keller and Simmons of ballistic and diffusive transport to simple three-dimensional sputter geometries is developed and applied. The sputter yield and the pressure-distance product are determined from the data set as the only fit parameters of the model. For the entire range of operation of the magnetron, the sputter process can be described in terms of the relatively simple approach.

Authors:
; ;  [1]
  1. Institute of Experimental Physics, University of Saarbruecken, P. O. Box 151150, 66041 Saarbruecken (Germany)
Publication Date:
OSTI Identifier:
20723216
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 23; Journal Issue: 6; Other Information: DOI: 10.1116/1.2091197; (c) 2005 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ARGON; DIFFUSION; ENERGY DEPENDENCE; MAGNETRONS; PRESSURE DEPENDENCE; SPACE DEPENDENCE; SPUTTERING; SUBSTRATES; SURFACE COATING; THIN FILMS; TITANIUM

Citation Formats

Knittel, Ivo, Gothe, Marc, and Hartmann, Uwe. Quantitative analysis of sputter processes in a small magnetron system. United States: N. p., 2005. Web. doi:10.1116/1.2091197.
Knittel, Ivo, Gothe, Marc, & Hartmann, Uwe. Quantitative analysis of sputter processes in a small magnetron system. United States. doi:10.1116/1.2091197.
Knittel, Ivo, Gothe, Marc, and Hartmann, Uwe. Tue . "Quantitative analysis of sputter processes in a small magnetron system". United States. doi:10.1116/1.2091197.
@article{osti_20723216,
title = {Quantitative analysis of sputter processes in a small magnetron system},
author = {Knittel, Ivo and Gothe, Marc and Hartmann, Uwe},
abstractNote = {Sputter deposition of titanium in argon from a small circular magnetron is characterized. The dependence of the deposition rate on pressure, power, and target-substrate distance has been measured. A framework for the application of the analytic approach by Keller and Simmons of ballistic and diffusive transport to simple three-dimensional sputter geometries is developed and applied. The sputter yield and the pressure-distance product are determined from the data set as the only fit parameters of the model. For the entire range of operation of the magnetron, the sputter process can be described in terms of the relatively simple approach.},
doi = {10.1116/1.2091197},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 6,
volume = 23,
place = {United States},
year = {Tue Nov 15 00:00:00 EST 2005},
month = {Tue Nov 15 00:00:00 EST 2005}
}