Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective
Abstract
In order to generate high-energy densities of 13.5 nm radiation, an extreme ultraviolet (EUV) Schwarzschild mirror objective with a numerical aperture of 0.44 and a demagnification of 10 was developed and adapted to a compact laser-based EUV source. The annular spherical mirror substrates were coated with Mo/Si multilayer systems. With a single mirror reflectance of more than 65% the total transmittance of the Schwarzschild objective exceeds 40% at 13.5 nm. From the properties of the EUV source (pulse energy 3 mJ at 13.5 nm and plasma diameter approximately 300 {mu}m), energy densities of 73 mJ/cm{sup 2} at a pulse length of 6 ns can be estimated in the image plane of the objective. As a first application, the formation of color centers in lithium fluoride crystals by EUV radiation was investigated. F{sub 2}, F{sub 3}, and F{sub 3}{sup +} color centers could be identified by absorption spectroscopy. The formation dynamics was studied as a function of the EUV dose. By imaging of a pinhole positioned behind the plasma, an EUV spot of 5 {mu}m diameter was generated, which accomplishes direct writing of color centers with micrometer resolution.
- Authors:
-
- Laser-Laboratorium Goettingen e.V., Hans-Adolf-Krebs-Weg 1, D-37077 Goettingen (Germany)
- Publication Date:
- OSTI Identifier:
- 20723182
- Resource Type:
- Journal Article
- Journal Name:
- Review of Scientific Instruments
- Additional Journal Information:
- Journal Volume: 76; Journal Issue: 10; Other Information: DOI: 10.1063/1.2072147; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ABSORPTION SPECTROSCOPY; APERTURES; CRYSTALS; ENERGY DENSITY; EXTREME ULTRAVIOLET RADIATION; F CENTERS; LASERS; LITHIUM FLUORIDES; MOLYBDENUM; PLASMA; PLASMA PRODUCTION; PULSES; REFLECTIVITY; SILICON; SPHERICAL CONFIGURATION
Citation Formats
Barkusky, Frank, Peth, Christian, Mann, Klaus, Feigl, Torsten, Kaiser, Norbert, and Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik, Albert-Einstein-Strasse 7, D-07745 Jena. Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective. United States: N. p., 2005.
Web. doi:10.1063/1.2072147.
Barkusky, Frank, Peth, Christian, Mann, Klaus, Feigl, Torsten, Kaiser, Norbert, & Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik, Albert-Einstein-Strasse 7, D-07745 Jena. Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective. United States. https://doi.org/10.1063/1.2072147
Barkusky, Frank, Peth, Christian, Mann, Klaus, Feigl, Torsten, Kaiser, Norbert, and Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik, Albert-Einstein-Strasse 7, D-07745 Jena. 2005.
"Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective". United States. https://doi.org/10.1063/1.2072147.
@article{osti_20723182,
title = {Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective},
author = {Barkusky, Frank and Peth, Christian and Mann, Klaus and Feigl, Torsten and Kaiser, Norbert and Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik, Albert-Einstein-Strasse 7, D-07745 Jena},
abstractNote = {In order to generate high-energy densities of 13.5 nm radiation, an extreme ultraviolet (EUV) Schwarzschild mirror objective with a numerical aperture of 0.44 and a demagnification of 10 was developed and adapted to a compact laser-based EUV source. The annular spherical mirror substrates were coated with Mo/Si multilayer systems. With a single mirror reflectance of more than 65% the total transmittance of the Schwarzschild objective exceeds 40% at 13.5 nm. From the properties of the EUV source (pulse energy 3 mJ at 13.5 nm and plasma diameter approximately 300 {mu}m), energy densities of 73 mJ/cm{sup 2} at a pulse length of 6 ns can be estimated in the image plane of the objective. As a first application, the formation of color centers in lithium fluoride crystals by EUV radiation was investigated. F{sub 2}, F{sub 3}, and F{sub 3}{sup +} color centers could be identified by absorption spectroscopy. The formation dynamics was studied as a function of the EUV dose. By imaging of a pinhole positioned behind the plasma, an EUV spot of 5 {mu}m diameter was generated, which accomplishes direct writing of color centers with micrometer resolution.},
doi = {10.1063/1.2072147},
url = {https://www.osti.gov/biblio/20723182},
journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 10,
volume = 76,
place = {United States},
year = {Sat Oct 15 00:00:00 EDT 2005},
month = {Sat Oct 15 00:00:00 EDT 2005}
}