Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)
In this study, we designed, fabricated, and evaluated a hard x-ray focusing mirror having an ideally focused beam with a full width at half maximum in the intensity profile of 36 nm at an x-ray energy of 15 keV. The designed elliptically curved shape was fabricated by a computer-controlled fabrication system using plasma chemical vaporization machining and elastic emission machining, on the basis of surface profiles accurately measured by combining microstitching interferometry with relative angle determinable stitching interferometry. A platinum-coated surface was employed for hard x-ray focusing with a large numerical aperture. Line-focusing tests on the fabricated elliptical mirror are carried out at the 1-km-long beamline of SPring-8. A full width at half maximum of 40 nm was achieved in the focused beam intensity profile under the best focus conditions.
- OSTI ID:
- 20722906
- Journal Information:
- Review of Scientific Instruments, Vol. 76, Issue 6; Other Information: DOI: 10.1063/1.1922827; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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