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Title: Self-Consistent Simulation of Pulsed and Continuous Microwave Discharges in Hydrogen

Abstract

Results are presented from numerical simulations of pulse-periodic and continuous microwave discharges in hydrogen that are used in CVD reactors for chemical vapor deposition of diamond films. Attention is focused on the processes that should be taken into account in order to construct the simplest possible adequate numerical model. It is shown that the processes of vibrational excitation of hydrogen molecules, as well as chemical reactions, play an important role in the establishment of energy balance within the discharges. The results of numerical simulations are compared to the experimental data.

Authors:
; ; ;  [1]
  1. Institute of Applied Physics, Russian Academy of Sciences, ul. Ul'yanova 46, Nizhni Novgorod, 603600 (Russian Federation)
Publication Date:
OSTI Identifier:
20718854
Resource Type:
Journal Article
Resource Relation:
Journal Name: Plasma Physics Reports; Journal Volume: 31; Journal Issue: 11; Other Information: Translated from Fizika Plazmy, ISSN 0367-2921, 31, 1038-1050 (No. 11, 2005); DOI: 10.1134/1.2131133; (c) 2005 Pleiades Publishing, Inc; Country of input: International Atomic Energy Agency (IAEA); TN:
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 36 MATERIALS SCIENCE; CHEMICAL VAPOR DEPOSITION; DIAMONDS; EXCITATION; HIGH-FREQUENCY DISCHARGES; HYDROGEN; MOLECULES; PERIODICITY; PLASMA; PLASMA SIMULATION; THIN FILMS

Citation Formats

Koldanov, V.A., Gorbachev, A.M., Vikharev, A.L., and Radishchev, D.B. Self-Consistent Simulation of Pulsed and Continuous Microwave Discharges in Hydrogen. United States: N. p., 2005. Web. doi:10.1134/1.2131133.
Koldanov, V.A., Gorbachev, A.M., Vikharev, A.L., & Radishchev, D.B. Self-Consistent Simulation of Pulsed and Continuous Microwave Discharges in Hydrogen. United States. doi:10.1134/1.2131133.
Koldanov, V.A., Gorbachev, A.M., Vikharev, A.L., and Radishchev, D.B. Tue . "Self-Consistent Simulation of Pulsed and Continuous Microwave Discharges in Hydrogen". United States. doi:10.1134/1.2131133.
@article{osti_20718854,
title = {Self-Consistent Simulation of Pulsed and Continuous Microwave Discharges in Hydrogen},
author = {Koldanov, V.A. and Gorbachev, A.M. and Vikharev, A.L. and Radishchev, D.B.},
abstractNote = {Results are presented from numerical simulations of pulse-periodic and continuous microwave discharges in hydrogen that are used in CVD reactors for chemical vapor deposition of diamond films. Attention is focused on the processes that should be taken into account in order to construct the simplest possible adequate numerical model. It is shown that the processes of vibrational excitation of hydrogen molecules, as well as chemical reactions, play an important role in the establishment of energy balance within the discharges. The results of numerical simulations are compared to the experimental data.},
doi = {10.1134/1.2131133},
journal = {Plasma Physics Reports},
number = 11,
volume = 31,
place = {United States},
year = {Tue Nov 15 00:00:00 EST 2005},
month = {Tue Nov 15 00:00:00 EST 2005}
}
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