Thickness dependence of magnetic anisotropy in thin Ni films electrodeposited onto the (011) and (001) surfaces of n-GaAs

Journal Article · Sun May 15 00:00:00 EDT 2005 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1846031· OSTI ID:20711638

Gubbiotti, G; Carlotti, G; Tacchi, S; Liu, Y -K; Scheck, C; Schad, R; Zangari, G ^[1]

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1. INFM CRS-SOFT, c/o Universita di Roma 'La Sapienza', I-00185, Rome (Italy)

Brillouin light scattering from thermal spin waves has been exploited to investigate the thickness dependence of magnetic anisotropy of Ni films, with thickness in the range 7-35 nm, grown by electrodeposition onto either (011)- or (001)-GaAs substrates. In the former case, Ni films exhibit a well-defined in-plane uniaxial anisotropy induced by the symmetry of the substrate. In the case of the (001)-GaAs substrate, instead, the magnetic anisotropy results from a combination of both a fourfold and a twofold contribution. The physical mechanisms responsible for the observed anisotropy, as well as its dependence on film thickness, are discussed in detail.

• OSTI ID: 20711638
• Journal Information: Journal of Applied Physics, Vol. 97, Issue 10; Conference: 49. annual conference on magnetism and magnetic materials, Jacksonville, FL (United States), 7-11 Nov 2004; Other Information: DOI: 10.1063/1.1846031; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANISOTROPY
BRILLOUIN EFFECT
ELECTRODEPOSITION
EPITAXY
FERROMAGNETIC MATERIALS
FILMS
GALLIUM ARSENIDES
HYSTERESIS
LAYERS
LIGHT SCATTERING
NICKEL
SPIN WAVES
SUBSTRATES
THICKNESS