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Title: Study on anomalous n-type conduction of P-doped ZnO using P{sub 2}O{sub 5} dopant source

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1938249· OSTI ID:20702398
; ;  [1]
  1. Institute of High Performance Computing, 1 Science Park Road, no. 01-01 The Capricorn, Singapore 117528 (Singapore)

The unexpected n-type conduction observed in P-doped ZnO thin films fabricated from rf magnetron sputtering, was studied systematically through a combined approach of experiment and computer modeling. The carrier stability was predicted from first-principles density functional theory and chemical thermodynamic calculations. It demonstrated that, under oxygen-poor growth condition and low temperature, the stable doping defect P{sub O}{sup -1} may have negative effect on n-type conduction and, under oxygen-poor growth condition and high temperature, the stable doping defect may contribute significantly to the n-type conduction. Furthermore, under oxygen-rich growth condition, the stable doping defect P{sub Zn}{sup 1} may help to maintain the n-type conduction at high oxygen partial pressures. Our model predictions are in good agreement with experimental observations in anomalous conduction of P{sub 2}O{sub 5}-doped ZnO thin films and provide scientific explanation. This research not only revealed increased fundamental understanding on electronic behaviors but also provided a fabrication strategy for P-doped n-type ZnO.

OSTI ID:
20702398
Journal Information:
Applied Physics Letters, Vol. 86, Issue 21; Other Information: DOI: 10.1063/1.1938249; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English