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Title: Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas

Abstract

Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ;  [1];  [2]; ; ; ;  [3];  [4]
  1. Institute of Laser Engineering, Osaka University, 2-6 Yamada-Oka, Suita, Osaka 565-0871 (Japan)
  2. Advanced Photon Research Center, Kansai Research Establishment, Japan Atomic Energy Research Institute, 8-1 Umemidai, Kizu, Kyoto 619-0215 (Japan)
  3. Institute for Laser Technology, 2-6 Yamada-Oka, Suita, Osaka 565-0871 (Japan)
  4. Department of Electrical and Electronic Engineering, Okayama University, 1-1 Naka 1-chome, Tsushima, Okayama 700-8350 (Japan)
Publication Date:
OSTI Identifier:
20699656
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physical Review Letters; Journal Volume: 95; Journal Issue: 23; Other Information: DOI: 10.1103/PhysRevLett.95.235004; (c) 2005 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ABSORPTION SPECTRA; EXTREME ULTRAVIOLET RADIATION; ION TEMPERATURE; LASER-PRODUCED PLASMA; LASERS; OPACITY; PLASMA DIAGNOSTICS; PLASMA PRODUCTION; TIN; WAVELENGTHS; X-RAY SPECTRA

Citation Formats

Fujioka, Shinsuke, Nishimura, Hiroaki, Nishihara, Katsunobu, Okuno, Tomoharu, Ueda, Nobuyoshi, Ando, Tsuyoshi, Tao, Yezheng, Shigemori, Keisuke, Nakai, Mitsuo, Nagai, Keiji, Norimatsu, Takayoshi, Miyanaga, Noriaki, Izawa, Yasukazu, Mima, Kunioki, Sasaki, Akira, Sunahara, Atsushi, Shimada, Yoshinori, Hashimoto, Kazuhisa, Yamaura, Michiteru, and Nishikawa, Takeshi. Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas. United States: N. p., 2005. Web. doi:10.1103/PhysRevLett.95.235004.
Fujioka, Shinsuke, Nishimura, Hiroaki, Nishihara, Katsunobu, Okuno, Tomoharu, Ueda, Nobuyoshi, Ando, Tsuyoshi, Tao, Yezheng, Shigemori, Keisuke, Nakai, Mitsuo, Nagai, Keiji, Norimatsu, Takayoshi, Miyanaga, Noriaki, Izawa, Yasukazu, Mima, Kunioki, Sasaki, Akira, Sunahara, Atsushi, Shimada, Yoshinori, Hashimoto, Kazuhisa, Yamaura, Michiteru, & Nishikawa, Takeshi. Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas. United States. doi:10.1103/PhysRevLett.95.235004.
Fujioka, Shinsuke, Nishimura, Hiroaki, Nishihara, Katsunobu, Okuno, Tomoharu, Ueda, Nobuyoshi, Ando, Tsuyoshi, Tao, Yezheng, Shigemori, Keisuke, Nakai, Mitsuo, Nagai, Keiji, Norimatsu, Takayoshi, Miyanaga, Noriaki, Izawa, Yasukazu, Mima, Kunioki, Sasaki, Akira, Sunahara, Atsushi, Shimada, Yoshinori, Hashimoto, Kazuhisa, Yamaura, Michiteru, and Nishikawa, Takeshi. Fri . "Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas". United States. doi:10.1103/PhysRevLett.95.235004.
@article{osti_20699656,
title = {Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas},
author = {Fujioka, Shinsuke and Nishimura, Hiroaki and Nishihara, Katsunobu and Okuno, Tomoharu and Ueda, Nobuyoshi and Ando, Tsuyoshi and Tao, Yezheng and Shigemori, Keisuke and Nakai, Mitsuo and Nagai, Keiji and Norimatsu, Takayoshi and Miyanaga, Noriaki and Izawa, Yasukazu and Mima, Kunioki and Sasaki, Akira and Sunahara, Atsushi and Shimada, Yoshinori and Hashimoto, Kazuhisa and Yamaura, Michiteru and Nishikawa, Takeshi},
abstractNote = {Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.},
doi = {10.1103/PhysRevLett.95.235004},
journal = {Physical Review Letters},
number = 23,
volume = 95,
place = {United States},
year = {Fri Dec 02 00:00:00 EST 2005},
month = {Fri Dec 02 00:00:00 EST 2005}
}