Ferroelectric behaviors and charge carriers in Nd-doped Bi{sub 4}Ti{sub 3}O{sub 12} thin films
- Department of Materials Science, Faculty of Science, National University of Singapore, Singapore 119260 (Singapore)
Nd-doped Bi{sub 4}Ti{sub 3}O{sub 12} thin films (Bi{sub 3.25}Nd{sub 0.85}){sub 4}Ti{sub 3}O{sub 12}, of layered perovskite structure were synthesized by rf sputtering, followed by postannealing at 600-700 deg. C. They show enhanced ferroelectricity with rising postannealing temperature in the range of 650-750 deg. C. When annealed at 700 deg. C, a remanent polarization 2P{sub r} of 25.2 {mu}C/cm{sup 2} and a coercive field E{sub c} of 87.2 kV/cm were measured at 9 V, together with an almost fatigue-free behavior up to 1.4x10{sup 10} switching cycles. Their ferroelectric, dielectric, and ac conductivity properties over the temperature range from 25 to 300 deg. C were studied over the frequency range of 0.1-1 MHz. Space-charge relaxation by oxygen vacancies was shown to play an important role in determining the dielectric and conductivity behaviors of Nd-doped Bi{sub 4}Ti{sub 3}O{sub 12} thin films.
- OSTI ID:
- 20665096
- Journal Information:
- Journal of Applied Physics, Vol. 97, Issue 3; Other Information: DOI: 10.1063/1.1834986; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ANNEALING
BISMUTH COMPOUNDS
CHARGE CARRIERS
DIELECTRIC MATERIALS
DOPED MATERIALS
ELECTRIC CONDUCTIVITY
FATIGUE
NEODYMIUM COMPOUNDS
OXYGEN
PERMITTIVITY
PEROVSKITE
POLARIZATION
RELAXATION
SPACE CHARGE
SPUTTERING
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0400-1000 K
THIN FILMS
TITANATES
VACANCIES