Refractive lenses fabricated by deep SR lithography and LIGA technology for X-ray energies from 1 keV to 1 MeV
Abstract
SU-8 polymer and Nickel were used to manufacture planar high aspect ratio X-ray refractive lenses by the LIGA process (Deep X-ray lithography, electroforming). The exposure of PMMA and highly sensitive SU-8 resist layers were carried out at the ANKA storage ring, Karlsruhe. Lenses of either round, segment or quasi-parabolic (kinoform) profiles have been designed, fabricated and tested at the ESRF and at the ANKA synchrotron sources with X-ray energies ranging from 12 to 55 keV. The SU-8 polymer lenses tested at ESRF showed an uniform focal line spot with FWHM of appr. 0.32 {mu}m and gains in the range of 320. The characteristics did not alter after an absorbed dose of 2 MJ/cm3. Lenses fabricated from electroplated Ni, 320 {mu}m thick, were tested at a photon energy of 212 keV. In this case the uniform focal line spot was about 5 {mu}m.
- Authors:
-
- Institut fuer Mikrostrukturtechnik/Forschungszentrum Karlsruhe GmbH, 76021 Karlsruhe (Germany)
- ESRF, BP-220, Grenoble Cedex (France)
- Institut fuer Synchrotron Strahlung/Forschungszentrum Karlsruhe GmbH, 76021 Karlsruhe (Germany)
- IMT RAS, Chernogolovka, 142432 (Russian Federation)
- Publication Date:
- OSTI Identifier:
- 20653060
- Resource Type:
- Journal Article
- Journal Name:
- AIP Conference Proceedings
- Additional Journal Information:
- Journal Volume: 705; Journal Issue: 1; Conference: 8. international conference on synchrotron radiation instrumentation, San Francisco, CA (United States), 25-29 Aug 2003; Other Information: DOI: 10.1063/1.1757905; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 43 PARTICLE ACCELERATORS; ASPECT RATIO; BEAM OPTICS; EUROPEAN SYNCHROTRON RADIATION FACILITY; FOCUSING; KEV RANGE; LAYERS; LENSES; NICKEL; PHOTONS; PMMA; REFRACTION; STORAGE RINGS; SYNCHROTRON RADIATION; X RADIATION
Citation Formats
Nazmov, V, Reznikova, E, Boerner, M, Mohr, J, Saile, V, Snigirev, A, Snigireva, I, DiMichiel, M, Drakopoulos, M, Simon, R, and Grigoriev, M. Refractive lenses fabricated by deep SR lithography and LIGA technology for X-ray energies from 1 keV to 1 MeV. United States: N. p., 2004.
Web. doi:10.1063/1.1757905.
Nazmov, V, Reznikova, E, Boerner, M, Mohr, J, Saile, V, Snigirev, A, Snigireva, I, DiMichiel, M, Drakopoulos, M, Simon, R, & Grigoriev, M. Refractive lenses fabricated by deep SR lithography and LIGA technology for X-ray energies from 1 keV to 1 MeV. United States. https://doi.org/10.1063/1.1757905
Nazmov, V, Reznikova, E, Boerner, M, Mohr, J, Saile, V, Snigirev, A, Snigireva, I, DiMichiel, M, Drakopoulos, M, Simon, R, and Grigoriev, M. 2004.
"Refractive lenses fabricated by deep SR lithography and LIGA technology for X-ray energies from 1 keV to 1 MeV". United States. https://doi.org/10.1063/1.1757905.
@article{osti_20653060,
title = {Refractive lenses fabricated by deep SR lithography and LIGA technology for X-ray energies from 1 keV to 1 MeV},
author = {Nazmov, V and Reznikova, E and Boerner, M and Mohr, J and Saile, V and Snigirev, A and Snigireva, I and DiMichiel, M and Drakopoulos, M and Simon, R and Grigoriev, M},
abstractNote = {SU-8 polymer and Nickel were used to manufacture planar high aspect ratio X-ray refractive lenses by the LIGA process (Deep X-ray lithography, electroforming). The exposure of PMMA and highly sensitive SU-8 resist layers were carried out at the ANKA storage ring, Karlsruhe. Lenses of either round, segment or quasi-parabolic (kinoform) profiles have been designed, fabricated and tested at the ESRF and at the ANKA synchrotron sources with X-ray energies ranging from 12 to 55 keV. The SU-8 polymer lenses tested at ESRF showed an uniform focal line spot with FWHM of appr. 0.32 {mu}m and gains in the range of 320. The characteristics did not alter after an absorbed dose of 2 MJ/cm3. Lenses fabricated from electroplated Ni, 320 {mu}m thick, were tested at a photon energy of 212 keV. In this case the uniform focal line spot was about 5 {mu}m.},
doi = {10.1063/1.1757905},
url = {https://www.osti.gov/biblio/20653060},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 705,
place = {United States},
year = {Wed May 12 00:00:00 EDT 2004},
month = {Wed May 12 00:00:00 EDT 2004}
}