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Title: Performances of the TXRF Beamline for Trace Element Mapping at the European Synchrotron Radiation Facility

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.1619752· OSTI ID:20632614
;  [1]
  1. ESRF, BP 220 - 38043 Grenoble cedex (France)

The pursuit of smaller and smaller circuitry in device manufacturing imposes tight limits on the surface contamination of the wafers. TXRF, Total Reflection X-ray Fluorescence, is the leading technique in device industry for detecting surface impurities. However, laboratory equipments have reached their limit, and the common practice then for reaching the desired sensitivities of {approx}109 atoms per cm square, equivalent to 10-6 monolayers, is then to proceed to pre-concentration of the impurities. This operation erases any information on the localisation of the impurities, making much more difficult the identification of their origin. Centralised facilities based on Synchrotron Radiation extend the reach of classical TXRF machines offering new opportunities both in terms of ultimate sensitivity, lateral resolution and detectable range of elements. In this contribution we will describe a dedicated TXRF instrument operational at the European Synchrotron Radiation Facility in Grenoble along with its performances, limitations and future developments.

OSTI ID:
20632614
Journal Information:
AIP Conference Proceedings, Vol. 680, Issue 1; Conference: 17. international conference on the application of accelerators in research and industry, Denton, TX (United States), 12-16 Nov 2002; Other Information: DOI: 10.1063/1.1619752; (c) 2003 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English