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Title: Comparison of Tophet-A and Evanohm-R alloys for producing thin film nichrome resistors. Final report

Abstract

The purported advantages of the Evanohm alloy were not observed in this preliminary study. Under the deposition conditions, the Evanohm alloy produced a greater variation in resistance of the as-deposited thin films than the Tophet alloy currently in use for producing resistors. A broader screening experiment for optimum operating conditions for the Evanohm wire is recommended.

Authors:
 [1];  [2]
+ Show Author Affiliations
  1. Oak Ridge National Lab., TN (United States)
  2. Vamistor Corp., Sevierville, TN (United States)
Publication Date:
Research Org.:
Oak Ridge Y-12 Plant, TN (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
204080
Report Number(s):
Y/AMT-269
ON: DE96006157; CRN: C/Y-12--93-0199
DOE Contract Number:
AC05-84OR21400
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: 28 Feb 1995
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; NICHROME; DEPOSITION; ELECTRIC CONDUCTIVITY; RESISTORS; THIN FILMS; PROGRESS REPORT

Citation Formats

Egert, C.M., and Boatman, J.. Comparison of Tophet-A and Evanohm-R alloys for producing thin film nichrome resistors. Final report. United States: N. p., 1995. Web. doi:10.2172/204080.
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Egert, C.M., & Boatman, J.. Comparison of Tophet-A and Evanohm-R alloys for producing thin film nichrome resistors. Final report. United States. doi:10.2172/204080.
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Egert, C.M., and Boatman, J.. Tue . "Comparison of Tophet-A and Evanohm-R alloys for producing thin film nichrome resistors. Final report". United States. doi:10.2172/204080. https://www.osti.gov/servlets/purl/204080.
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@article{osti_204080,
title = {Comparison of Tophet-A and Evanohm-R alloys for producing thin film nichrome resistors. Final report},
author = {Egert, C.M. and Boatman, J.},
abstractNote = {The purported advantages of the Evanohm alloy were not observed in this preliminary study. Under the deposition conditions, the Evanohm alloy produced a greater variation in resistance of the as-deposited thin films than the Tophet alloy currently in use for producing resistors. A broader screening experiment for optimum operating conditions for the Evanohm wire is recommended.},
doi = {10.2172/204080},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 28 00:00:00 EST 1995},
month = {Tue Feb 28 00:00:00 EST 1995}
}
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Technical Report:
View Technical Report (0.29 MB)
DOI:  10.2172/204080
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