High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis

Blain, M G; Stevens, J E; Woodworth, J R

doi:10.1063/1.125495

Title: High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis

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Abstract

A retarding potential energy analyzer having 750 nm diameter, self-aligned grid apertures and micron scale grid separation has been fabricated using polycrystalline silicon and silicon dioxide. High-resolution in situ measurements of ion velocity distributions have been demonstrated in inductively coupled argon plasmas. Measurement results agree well with those from a macroscopic analyzer. Important differences are observed in the energies of plasma ions when measured with respect to chamber wall versus those measured with respect to the plasma floating potential. Preliminary measurements under rf bias conditions have also been made and results follow the expected trends. (c) 1999 American Institute of Physics.

Authors:

Blain, M G ^[1]; Stevens, J E ^[1]; Woodworth, J R ^[1]

Sandia National Laboratories, Albuquerque, New Mexico 87185-1077 (United States)

Publication Date:: Mon Dec 20 00:00:00 EST 1999

OSTI Identifier:: 20217754

Resource Type:: Journal Article

Journal Name:: Applied Physics Letters

Additional Journal Information:: Journal Volume: 75; Journal Issue: 25; Other Information: PBD: 20 Dec 1999; Journal ID: ISSN 0003-6951

Country of Publication:: United States

Language:: English

Subject:: 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; PLASMA DIAGNOSTICS; MEASURING METHODS; SILICON; SILICON OXIDES; ENERGY ANALYSIS; ION DETECTION; ELECTRIC DISCHARGES; SPACE CHARGE; EXPERIMENTAL DATA

Citation Formats


                    Blain, M G, Stevens, J E, and Woodworth, J R. High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis.  United States: N. p., 1999. 
        Web.  doi:10.1063/1.125495.

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                    Blain, M G, Stevens, J E, & Woodworth, J R. High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis.  United States.  https://doi.org/10.1063/1.125495

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                    Blain, M G, Stevens, J E, and Woodworth, J R. 1999.  
        "High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis".  United States.  https://doi.org/10.1063/1.125495.

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@article{osti_20217754,

  title        = {High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis},

  author       = {Blain, M G and Stevens, J E and Woodworth, J R},

  abstractNote = {A retarding potential energy analyzer having 750 nm diameter, self-aligned grid apertures and micron scale grid separation has been fabricated using polycrystalline silicon and silicon dioxide. High-resolution in situ measurements of ion velocity distributions have been demonstrated in inductively coupled argon plasmas. Measurement results agree well with those from a macroscopic analyzer. Important differences are observed in the energies of plasma ions when measured with respect to chamber wall versus those measured with respect to the plasma floating potential. Preliminary measurements under rf bias conditions have also been made and results follow the expected trends. (c) 1999 American Institute of Physics.},

  doi          = {10.1063/1.125495},

  url          = {https://www.osti.gov/biblio/20217754},
  journal      = {Applied Physics Letters},

  issn         = {0003-6951},

  number       = 25,

  volume       = 75,

  place        = {United States},

  year         = {Mon Dec 20 00:00:00 EST 1999},

  month        = {Mon Dec 20 00:00:00 EST 1999}

}

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A High Resolution Sub-Micron Retarding Field Energy Analyzer for Low Temperature Plasma Analysis

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