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Title: At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems

Abstract

The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented. (c) 2000 Optical Society of America.

Authors:
 [1];  [1];  [1];  [1]
  1. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Brekeley, California 94720 (United States)
Publication Date:
OSTI Identifier:
20217161
Resource Type:
Journal Article
Journal Name:
Applied Optics
Additional Journal Information:
Journal Volume: 39; Journal Issue: 17; Other Information: PBD: 10 Jun 2000; Journal ID: ISSN 0003-6935
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; X-RAY EQUIPMENT; EXTREME ULTRAVIOLET RADIATION; X-RAY DIFFRACTION; INTERFEROMETRY; SPATIAL RESOLUTION; PHASE SHIFT

Citation Formats

Naulleau, Patrick, Goldberg, Kenneth A., Gullikson, Eric M., and Bokor, Jeffrey. At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems. United States: N. p., 2000. Web. doi:10.1364/AO.39.002941.
Naulleau, Patrick, Goldberg, Kenneth A., Gullikson, Eric M., & Bokor, Jeffrey. At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems. United States. doi:10.1364/AO.39.002941.
Naulleau, Patrick, Goldberg, Kenneth A., Gullikson, Eric M., and Bokor, Jeffrey. Sat . "At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems". United States. doi:10.1364/AO.39.002941.
@article{osti_20217161,
title = {At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems},
author = {Naulleau, Patrick and Goldberg, Kenneth A. and Gullikson, Eric M. and Bokor, Jeffrey},
abstractNote = {The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented. (c) 2000 Optical Society of America.},
doi = {10.1364/AO.39.002941},
journal = {Applied Optics},
issn = {0003-6935},
number = 17,
volume = 39,
place = {United States},
year = {2000},
month = {6}
}