Characterizing the hard x-ray diffraction properties of a GaAs linear Bragg-Fresnel lens

Journal Article · Mon Jul 17 00:00:00 EDT 2000 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.126961· OSTI ID:20217001

Li, Youli ^[1]; Wong, Gerard C. L. ^[1]; Case, Ryan ^[1]; Safinya, Cyrus R ^[1]; Caine, Ernie ^[2]; Hu, Evelyn ^[2]; Fernandez, Partricia ^[3]

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1. Materials Research Laboratory, Materials and Physics Departments, University of California, Santa Barbara, California 93106 (United States)
2. Electrical and Computer Engineering Department and National Nanofabrication Users Network (NNUN), University of California, Santa Barbara, California 93106 (United States)
3. The Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)

We investigated the diffractive focusing properties of (111) GaAs linear Bragg-Fresnel lenses (BFLs) developed for hard x-ray microscopy and microdiffraction of complex materials in confined geometries. We demonstrated that the use of GaAs yields significant processing advantages due to the reduced zone depth. Focal plane diffraction patterns of linear BFLs measured at the advanced photon source using 8-40 keV x rays were compared to a simple model based on Kirchhoff-Fresnel diffraction theory. Good agreement was obtained between experimental data and model calculations using only zones within an effective aperture defined by the transverse coherence of the source. (c) 2000 American Institute of Physics.

• OSTI ID: 20217001
• Journal Information: Applied Physics Letters, Vol. 77, Issue 3; Other Information: PBD: 17 Jul 2000; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
GALLIUM ARSENIDES
HARD X RADIATION
FRESNEL LENS
BRAGG REFLECTION
X-RAY DIFFRACTION
MICROSCOPY
EXPERIMENTAL DATA