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Title: Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system

Abstract

We investigate the design for a scattering with angular limitation in projection electron-beam lithography (SCALPEL) based electron projection system with a demagnification of -4. By a ''field-flip'' process we can construct a doublet in which the magnetic field has a flat feature in most of the optic column but opposite sign at two sides connected by a sharp transition region. Such a theoretical model can give a near zero chromatic aberration of rotation and much smaller field curvature and astigmatism. Compared with the conventional doublet, the total image blur caused by aberrations at 1/(sq root)(2) mm off-axis distance and 1.5 mrad semiangle aperture at the mask side is about only 24 nm for a column length of 400 mm. A shorter column, less than the current 400 mm, is also favored for further reducing the total aberration. These guarantee that we can choose a much larger aperture angle (compared with present 0.5 mrad) and beam current density in such a SCALPEL projection system to achieve higher throughput while still maintaining current resolution. A practical issue for possible magnetic lens design is also discussed. (c) 2000 American Vacuum Society.

Authors:
 [1];  [1];  [2]
  1. Department of Physics, University of Illinois, Urbana, Illinois 61801 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
20216756
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
Additional Journal Information:
Journal Volume: 18; Journal Issue: 3; Other Information: PBD: May 2000; Journal ID: ISSN 0734-211X
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ELECTRON BEAMS; MICROELECTRONICS; DESIGN; MAGNETIC FIELDS; CHROMATIC ABERRATIONS; BEAM OPTICS; CURRENT DENSITY; ELECTROMAGNETIC LENSES; SCATTERING

Citation Formats

Xiu, K., Gibson, J. M., and Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439-4838. Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system. United States: N. p., 2000. Web. doi:10.1116/1.591378.
Xiu, K., Gibson, J. M., & Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439-4838. Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system. United States. doi:10.1116/1.591378.
Xiu, K., Gibson, J. M., and Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439-4838. Mon . "Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system". United States. doi:10.1116/1.591378.
@article{osti_20216756,
title = {Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system},
author = {Xiu, K. and Gibson, J. M. and Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439-4838},
abstractNote = {We investigate the design for a scattering with angular limitation in projection electron-beam lithography (SCALPEL) based electron projection system with a demagnification of -4. By a ''field-flip'' process we can construct a doublet in which the magnetic field has a flat feature in most of the optic column but opposite sign at two sides connected by a sharp transition region. Such a theoretical model can give a near zero chromatic aberration of rotation and much smaller field curvature and astigmatism. Compared with the conventional doublet, the total image blur caused by aberrations at 1/(sq root)(2) mm off-axis distance and 1.5 mrad semiangle aperture at the mask side is about only 24 nm for a column length of 400 mm. A shorter column, less than the current 400 mm, is also favored for further reducing the total aberration. These guarantee that we can choose a much larger aperture angle (compared with present 0.5 mrad) and beam current density in such a SCALPEL projection system to achieve higher throughput while still maintaining current resolution. A practical issue for possible magnetic lens design is also discussed. (c) 2000 American Vacuum Society.},
doi = {10.1116/1.591378},
journal = {Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena},
issn = {0734-211X},
number = 3,
volume = 18,
place = {United States},
year = {2000},
month = {5}
}