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Title: Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting

Abstract

Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 nm thick, are deposited on SiO{sub 2} substrates and subsequently bombarded by 800 keV Kr{sup +}. Ion doses of >2x10{sup 14} initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ({approx}2x10{sup 16} cm{sup -2}), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr{sup +} impacts. (c) 2000 American Institute of Physics.

Authors:
 [1];  [1];  [1]
  1. Department of Materials Science and the Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
Publication Date:
OSTI Identifier:
20216500
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 76; Journal Issue: 22; Other Information: PBD: 29 May 2000; Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; PLATINUM; THIN FILMS; RADIATION EFFECTS; ION BEAMS; WETTABILITY; SURFACE PROPERTIES; MICROSCOPY; EXPERIMENTAL DATA

Citation Formats

Hu, Xiaoyuan, Cahill, David G., and Averback, Robert S. Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting. United States: N. p., 2000. Web. doi:10.1063/1.126633.
Hu, Xiaoyuan, Cahill, David G., & Averback, Robert S. Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting. United States. doi:10.1063/1.126633.
Hu, Xiaoyuan, Cahill, David G., and Averback, Robert S. Mon . "Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting". United States. doi:10.1063/1.126633.
@article{osti_20216500,
title = {Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting},
author = {Hu, Xiaoyuan and Cahill, David G. and Averback, Robert S.},
abstractNote = {Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 nm thick, are deposited on SiO{sub 2} substrates and subsequently bombarded by 800 keV Kr{sup +}. Ion doses of >2x10{sup 14} initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ({approx}2x10{sup 16} cm{sup -2}), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr{sup +} impacts. (c) 2000 American Institute of Physics.},
doi = {10.1063/1.126633},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 22,
volume = 76,
place = {United States},
year = {2000},
month = {5}
}