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Title: Electron and negative ion densities in C{sub 2}F{sub 6} and CHF{sub 3} containing inductively coupled discharges

Abstract

Electron and negative ion densities have been measured in inductively coupled discharges containing C{sub 2}F{sub 6} and CHF{sub 3}. Line integrated electron density was determined using a microwave interferometer, negative ion densities were inferred using laser photodetachment spectroscopy, and electron temperature was determined using a Langmuir probe. For the range of induction powers, pressures and bias power investigated, the electron density peaked at 9x10{sup 12} cm{sup -2} (line-integrated) or approximately 9x10{sup 11} cm{sup -3}. The negative ion density peaked at approximately 1.3x10{sup 11} cm{sup -3}. A maximum in the negative ion density as a function of induction coil power was observed. The maximum is attributed to a power dependent change in the density of one or more of the potential negative ion precursor species since the electron temperature did not depend strongly on power. The variation of photodetachment with laser wavelength indicated that the dominant negative ion was F{sup -}. Measurement of the decay of the negative ion density in the afterglow of a pulse modulated discharge was used to determine the ion-ion recombination rate for CF{sub 4}, C{sub 2}F{sub 6}, and CHF{sub 3} discharges. (c) 2000 American Institute of Physics.

Authors:
 [1];  [1]
  1. Sandia National Laboratories, Albuquerque, New Mexico 87185-1423 (United States)
Publication Date:
OSTI Identifier:
20216369
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 87; Journal Issue: 11; Other Information: PBD: 1 Jun 2000; Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ELECTRIC DISCHARGES; CARBON FLUORIDES; MICROELECTRONICS; ION DENSITY; ELECTRON DENSITY; ELECTRON DETACHMENT; RECOMBINATION; INTERFEROMETRY; ELECTRON TEMPERATURE; EXPERIMENTAL DATA

Citation Formats

Hebner, G. A., and Miller, P. A. Electron and negative ion densities in C{sub 2}F{sub 6} and CHF{sub 3} containing inductively coupled discharges. United States: N. p., 2000. Web. doi:10.1063/1.373437.
Hebner, G. A., & Miller, P. A. Electron and negative ion densities in C{sub 2}F{sub 6} and CHF{sub 3} containing inductively coupled discharges. United States. doi:10.1063/1.373437.
Hebner, G. A., and Miller, P. A. Thu . "Electron and negative ion densities in C{sub 2}F{sub 6} and CHF{sub 3} containing inductively coupled discharges". United States. doi:10.1063/1.373437.
@article{osti_20216369,
title = {Electron and negative ion densities in C{sub 2}F{sub 6} and CHF{sub 3} containing inductively coupled discharges},
author = {Hebner, G. A. and Miller, P. A.},
abstractNote = {Electron and negative ion densities have been measured in inductively coupled discharges containing C{sub 2}F{sub 6} and CHF{sub 3}. Line integrated electron density was determined using a microwave interferometer, negative ion densities were inferred using laser photodetachment spectroscopy, and electron temperature was determined using a Langmuir probe. For the range of induction powers, pressures and bias power investigated, the electron density peaked at 9x10{sup 12} cm{sup -2} (line-integrated) or approximately 9x10{sup 11} cm{sup -3}. The negative ion density peaked at approximately 1.3x10{sup 11} cm{sup -3}. A maximum in the negative ion density as a function of induction coil power was observed. The maximum is attributed to a power dependent change in the density of one or more of the potential negative ion precursor species since the electron temperature did not depend strongly on power. The variation of photodetachment with laser wavelength indicated that the dominant negative ion was F{sup -}. Measurement of the decay of the negative ion density in the afterglow of a pulse modulated discharge was used to determine the ion-ion recombination rate for CF{sub 4}, C{sub 2}F{sub 6}, and CHF{sub 3} discharges. (c) 2000 American Institute of Physics.},
doi = {10.1063/1.373437},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 11,
volume = 87,
place = {United States},
year = {2000},
month = {6}
}