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Title: Monte Carlo simulation of vapor transport in physical vapor deposition of titanium

Abstract

In this work, the direct simulation Monte Carlo (DSMC) method is used to model the physical vapor deposition of titanium using electron-beam evaporation. Titanium atoms are vaporized from a molten pool at a very high temperature and are accelerated collisionally to the deposition surface. The electronic excitation of the vapor is significant at the temperatures of interest. Energy transfer between the electronic and translational modes of energy affects the flow significantly. The electronic energy is modeled in the DSMC method and comparisons are made between simulations in which electronic energy is excluded from and included among the energy modes of particles. The experimentally measured deposition profile is also compared to the results of the simulations. It is concluded that electronic energy is an important factor to consider in the modeling of flows of this nature. The simulation results show good agreement with experimental data. (c) 2000 American Vacuum Society.

Authors:
 [1];  [1];  [2]
  1. Sibley School of Mechanical and Aerospace Engineering, Cornell University, Ithaca, New York 14853 (United States)
  2. Lawrence Livermore National Laboratory, Livermore, California 94550 (United States)
Publication Date:
OSTI Identifier:
20216311
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 18; Journal Issue: 3; Other Information: PBD: May 2000; Journal ID: ISSN 0734-2101
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; TITANIUM; SIMULATION; MONTE CARLO METHOD; PHYSICAL VAPOR DEPOSITION; ELECTRON BEAMS; THEORETICAL DATA; ENERGY BEAM DEPOSITION; THIN FILMS

Citation Formats

Balakrishnan, Jitendra, Boyd, Iain D., and Braun, David G. Monte Carlo simulation of vapor transport in physical vapor deposition of titanium. United States: N. p., 2000. Web. doi:10.1116/1.582274.
Balakrishnan, Jitendra, Boyd, Iain D., & Braun, David G. Monte Carlo simulation of vapor transport in physical vapor deposition of titanium. United States. doi:10.1116/1.582274.
Balakrishnan, Jitendra, Boyd, Iain D., and Braun, David G. Mon . "Monte Carlo simulation of vapor transport in physical vapor deposition of titanium". United States. doi:10.1116/1.582274.
@article{osti_20216311,
title = {Monte Carlo simulation of vapor transport in physical vapor deposition of titanium},
author = {Balakrishnan, Jitendra and Boyd, Iain D. and Braun, David G.},
abstractNote = {In this work, the direct simulation Monte Carlo (DSMC) method is used to model the physical vapor deposition of titanium using electron-beam evaporation. Titanium atoms are vaporized from a molten pool at a very high temperature and are accelerated collisionally to the deposition surface. The electronic excitation of the vapor is significant at the temperatures of interest. Energy transfer between the electronic and translational modes of energy affects the flow significantly. The electronic energy is modeled in the DSMC method and comparisons are made between simulations in which electronic energy is excluded from and included among the energy modes of particles. The experimentally measured deposition profile is also compared to the results of the simulations. It is concluded that electronic energy is an important factor to consider in the modeling of flows of this nature. The simulation results show good agreement with experimental data. (c) 2000 American Vacuum Society.},
doi = {10.1116/1.582274},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 3,
volume = 18,
place = {United States},
year = {2000},
month = {5}
}