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Title: Atom probe analysis of planar multilayer structures

Abstract

Atom probe field ion microscopy has been used to analyze a planar-deposited layered structure in plan view. The specimens were prepared with a newly developed method that involves a combination of photolithography and focused ion-beam milling. A multilayer structure consisting of (left brace)Ta/CoFe/(Cu/CoFe){sub 15}/Ru/(CoFe/Ru){sub 5}/Ru/NiFe{r_brace} was sputter deposited for use as a test stack. The corresponding thicknesses of these layers were 7/13(3/3)/50/(3/1)/50/150 nm. The nanometer-scale periodicity of the Cu/CoFe stack is readily apparent in transmission electron microscopy images of a field ion specimen fabricated from this material, suggesting that the specimen preparation procedure does not lead to destruction of the multilayer structure. Atom probe analysis of the bulk NiFe layer and the Ru/NiFe interface revealed the distribution of impurity atoms in the film, and these may affect the magnetic properties of the multilayers. Whereas a uniform distribution of C, N and Ar was observed, segregation of O was observed in the NiFe layer within {approx}0.25 nm of the interphase interface, with a concentration greater than 20 times that found in the bulk of the NiFe layer. (c) 2000 American Institute of Physics.

Authors:
 [1];  [2];  [2];  [3];  [1]
  1. Recording Head Operations, Seagate Technology, 7801 Computer Avenue South, Minneapolis, Minnesota 55435 (United States)
  2. Department of Materials Science and Engineering, University of Wisconsin, Madison, Wisconsin 53706 (United States)
  3. Metals and Ceramics Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, Tennessee 37831 (United States)
Publication Date:
OSTI Identifier:
20216258
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 87; Journal Issue: 9; Other Information: PBD: 1 May 2000; Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ION MICROSCOPY; LAYERS; STRUCTURAL CHEMICAL ANALYSIS; TANTALUM; COBALT ALLOYS; IRON ALLOYS; RUTHENIUM; NICKEL ALLOYS; TRANSMISSION ELECTRON MICROSCOPY; INTERFACES; IMPURITIES; EXPERIMENTAL DATA

Citation Formats

Larson, D. J., Martens, R. L., Kelly, T. F., Miller, M. K., and Tabat, N. Atom probe analysis of planar multilayer structures. United States: N. p., 2000. Web. doi:10.1063/1.372589.
Larson, D. J., Martens, R. L., Kelly, T. F., Miller, M. K., & Tabat, N. Atom probe analysis of planar multilayer structures. United States. doi:10.1063/1.372589.
Larson, D. J., Martens, R. L., Kelly, T. F., Miller, M. K., and Tabat, N. Mon . "Atom probe analysis of planar multilayer structures". United States. doi:10.1063/1.372589.
@article{osti_20216258,
title = {Atom probe analysis of planar multilayer structures},
author = {Larson, D. J. and Martens, R. L. and Kelly, T. F. and Miller, M. K. and Tabat, N.},
abstractNote = {Atom probe field ion microscopy has been used to analyze a planar-deposited layered structure in plan view. The specimens were prepared with a newly developed method that involves a combination of photolithography and focused ion-beam milling. A multilayer structure consisting of (left brace)Ta/CoFe/(Cu/CoFe){sub 15}/Ru/(CoFe/Ru){sub 5}/Ru/NiFe{r_brace} was sputter deposited for use as a test stack. The corresponding thicknesses of these layers were 7/13(3/3)/50/(3/1)/50/150 nm. The nanometer-scale periodicity of the Cu/CoFe stack is readily apparent in transmission electron microscopy images of a field ion specimen fabricated from this material, suggesting that the specimen preparation procedure does not lead to destruction of the multilayer structure. Atom probe analysis of the bulk NiFe layer and the Ru/NiFe interface revealed the distribution of impurity atoms in the film, and these may affect the magnetic properties of the multilayers. Whereas a uniform distribution of C, N and Ar was observed, segregation of O was observed in the NiFe layer within {approx}0.25 nm of the interphase interface, with a concentration greater than 20 times that found in the bulk of the NiFe layer. (c) 2000 American Institute of Physics.},
doi = {10.1063/1.372589},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 9,
volume = 87,
place = {United States},
year = {2000},
month = {5}
}