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Title: High numerical aperture projection system for extreme ultraviolet projection lithography

Abstract

An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

Authors:
Publication Date:
Sponsoring Org.:
US Department of Energy
OSTI Identifier:
20075843
Alternate Identifier(s):
OSTI ID: 20075843
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 6 Jun 2000
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; OPTICAL SYSTEMS; EXTREME ULTRAVIOLET RADIATION; MASKING; RESOLUTION; MICROELECTRONIC CIRCUITS; FABRICATION

Citation Formats

Hudyma, R.M. High numerical aperture projection system for extreme ultraviolet projection lithography. United States: N. p., 2000. Web.
Hudyma, R.M. High numerical aperture projection system for extreme ultraviolet projection lithography. United States.
Hudyma, R.M. Tue . "High numerical aperture projection system for extreme ultraviolet projection lithography". United States.
@article{osti_20075843,
title = {High numerical aperture projection system for extreme ultraviolet projection lithography},
author = {Hudyma, R.M.},
abstractNote = {An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {6}
}