Dynamics of contact angle during growth and detachment of a vapor bubble at a single nucleation site
Nucleate boiling is an efficient means of heat transfer especially where high heat fluxes are involved. Contact angle is an important parameter needed in the mechanistic models for prediction of nucleate boiling heat transfer. The present study focuses on variation of contact angle with interface velocity for a single nucleating bubble on a silicon wafer. Photographic images are acquired during inception, growth and departure of a bubble and the data are reduced to determine the interface velocity and contact angle at each stage of its growth. The results indicate that the contact angle depends primarily on whether the front is advancing or receding. Its dependency on the interface velocity is found to be weak in the range studied. For the test surface of Silicon wafer tested and for water as the test liquid contact angles of 61{degree}, 55{degree} and 49{degree} are found for advancing front, static and receding fronts respectively.
- Research Organization:
- Univ. of California, Los Angeles, CA (US)
- OSTI ID:
- 20026815
- Resource Relation:
- Conference: 5th ASME/JSME Thermal Engineering Joint Conference, San Diego, CA (US), 03/14/1999--03/19/1999; Other Information: 1 CD-ROM. Operating system required: Windows i386(tm), i486(tm), Pentium (R) or Pentium Pro, MS Windows 3.1, 95, or NT 3.51, 8 MB RAM, MacIntosh and Power MacIntosh with a 68020 or greater processor, System software version 7.1, 3.5 MB RAM (5 MB for PowerMac) 6 MB available hard-disk space, Unix; PBD: 1999; Related Information: In: Proceedings of the 5th ASME/JSME thermal engineering joint conference, [3600] pages.
- Country of Publication:
- United States
- Language:
- English
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