Structural and mechanical properties of amorphous silicon-carbon alloy films deposited by filtered cathodic vacuum arc technique
Amorphous silicon-carbon alloy films have been successfully deposited by filtered cathodic vacuum arc technique. The structural and mechanical properties of the films were investigated by using x-ray photoelectron spectroscopy (XPS), Raman spectroscopy, surface profiler and nano-indenter. The silicon content in the films determined by XPS measurement varies from 2.4 to 48 at.%. Both XPS and Raman spectroscopy show the existence of silicon carbide clusters in the films containing intermediate concentration of silicon. The silicon atoms predominantly substitute the carbon atom into the carbon clusters at low silicon concentration, and form amorphous silicon carbide clusters or amorphous silicon clusters at high silicon concentration. The hardness of the films varies from 60 to 22 GPa while the stress reduces from 8.0 to 2.1 GPa.
- Research Organization:
- Nanyang Technological Univ. (SG)
- OSTI ID:
- 20023275
- Journal Information:
- International Journal of Modern Physics B, Vol. 14, Issue 2-3; Conference: Second International Specialist Meetings on Amorphous Carbon, Singapore, 07/14/1999--07/16/1999; Other Information: PBD: 30 Jan 2000; ISSN 0217-9792
- Country of Publication:
- United States
- Language:
- English
Similar Records
Thermal stability and diffusion characteristics of ultrathin amorphous carbon films grown on crystalline and nitrogenated silicon substrates by filtered cathodic vacuum arc deposition
Effect of Remnant Carbon and Etching of Particles on Pyrolysis Bonded Silicon Carbide (PBSC)