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Title: Turnover of texture in low rate sputter-deposited nanocrystalline molybdenum films

Abstract

The crystallite size and orientation in molybdenum films prepared by magnetron sputtering at a low rate of typical 1 {angstrom}/s and a pressure of 0.45 Pa was investigated by X-ray diffraction and texture analysis. The surface topography was studied using atomic force microscopy. Increasing the film thickness from 20 nm to 3 {micro}m, the films show a turnover from a (110) fiber texture to a (211) mosaic-like texture. In the early state of growth (20 nm thickness) the development of dome-like structures on the surface is observed. The number of these structures increases with film thickness, whereas their size is weakly influenced. The effect of texture turnover is reduced by increasing the deposition rate by a factor of six, and it is absent for samples mounted above the center of the magnetron source. The effect of texture turnover is related to the bombardment of the films with high energetic argon neutrals resulting from backscattering at the target under oblique angle and causing resputtering. Due to the narrow angular distribution of the reflected argon, bombardment of the substrate plane is inhomogeneous and only significant for regions close to the erosion zone of the magnetron.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Abt. Festkoerperphysik der Otto-von-Guericke-Univ., Magdeburg (DE)
Sponsoring Org.:
Deutsche Forschungsgemeinschaft DFG (German Research Partnership)
OSTI Identifier:
20015523
Resource Type:
Conference
Resource Relation:
Conference: Polycrystalline thin films - Structure, Texture, Properties and Applications III, San Francisco, CA (US), 03/31/1997--04/04/1997; Other Information: Single article reprints from this publication are available through University Microfilms Inc., 300 North Zeeb Road, Ann Arbor, MI 48106; PBD: 1997; Related Information: In: Polycrystalline thin films -- Structure, texture, properties and applications III. Materials Research Society symposium proceedings: Volume 472, by Yalisove, S.M.; Adams, B.L.; Im, J.S.; Zhu, Y.; Chen, F.R. [eds.], 489 pages.
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CRYSTAL STRUCTURE; TEXTURE; SPUTTERING; MOLYBDENUM; THIN FILMS; X-RAY DIFFRACTION; MICROSCOPY; TOPOGRAPHY; EXPERIMENTAL DATA

Citation Formats

Druesedau, T.P., Klabunde, F., Loehmann, M., Hempel, T., and Blaesing, J. Turnover of texture in low rate sputter-deposited nanocrystalline molybdenum films. United States: N. p., 1997. Web.
Druesedau, T.P., Klabunde, F., Loehmann, M., Hempel, T., & Blaesing, J. Turnover of texture in low rate sputter-deposited nanocrystalline molybdenum films. United States.
Druesedau, T.P., Klabunde, F., Loehmann, M., Hempel, T., and Blaesing, J. 1997. "Turnover of texture in low rate sputter-deposited nanocrystalline molybdenum films". United States. doi:.
@article{osti_20015523,
title = {Turnover of texture in low rate sputter-deposited nanocrystalline molybdenum films},
author = {Druesedau, T.P. and Klabunde, F. and Loehmann, M. and Hempel, T. and Blaesing, J.},
abstractNote = {The crystallite size and orientation in molybdenum films prepared by magnetron sputtering at a low rate of typical 1 {angstrom}/s and a pressure of 0.45 Pa was investigated by X-ray diffraction and texture analysis. The surface topography was studied using atomic force microscopy. Increasing the film thickness from 20 nm to 3 {micro}m, the films show a turnover from a (110) fiber texture to a (211) mosaic-like texture. In the early state of growth (20 nm thickness) the development of dome-like structures on the surface is observed. The number of these structures increases with film thickness, whereas their size is weakly influenced. The effect of texture turnover is reduced by increasing the deposition rate by a factor of six, and it is absent for samples mounted above the center of the magnetron source. The effect of texture turnover is related to the bombardment of the films with high energetic argon neutrals resulting from backscattering at the target under oblique angle and causing resputtering. Due to the narrow angular distribution of the reflected argon, bombardment of the substrate plane is inhomogeneous and only significant for regions close to the erosion zone of the magnetron.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = 1997,
month = 7
}

Conference:
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  • This paper demonstrates experimentally that ultra-thin, nanocrystalline films can exhibit coexisting colossal stress and texture depth gradients. Their quantitative determination is possible by X-ray diffraction experiments. Whereas a uniform texture by itself is known to generally cause curvature in so-called sin{sup 2}ψ plots, it is shown that the combined action of texture and stress gradients provides a separate source of curvature in sin{sup 2}ψ plots (i.e., even in cases where a uniform texture does not induce such curvature). On this basis, the texture and stress depth profiles of a nanocrystalline, ultra-thin (50 nm) tungsten film could be determined.
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