Reflective optical imaging system with balanced distortion

Patent · Tue Oct 26 00:00:00 EDT 1999

OSTI ID:20013788

Chapman, H N; Hudyma, R M; Shafer, D R; Sweeney, D W

An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate is disclosed. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.

• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 20013788
• Resource Relation: Other Information: PBD: 26 Oct 1999
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
OPTICAL SYSTEMS
EXTREME ULTRAVIOLET RADIATION
MASKING
DESIGN
SEMICONDUCTOR DEVICES
MANUFACTURING