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Title: Covalently bonded disordered thin-film materials. Materials Research Society symposium proceedings Volume 498

Abstract

The current and potential impact of covalently bonded disordered thin films is enormous. These materials are amorphous-to-nanocrystalline structures made from light atomic weight elements from the first row of the periodic table. Examples include amorphous tetrahedral diamond-like carbon, boron nitride, carbon nitride, boron carbide, and boron-carbon-nitride. These materials are under development for use as novel low-power, high-visibility elements in flat-panel display technologies, cold-cathode sources for microsensors and vacuum microelectronics, encapsulants for both environmental protection and microelectronics, optical coatings for laser windows, and ultra-hard tribological coatings. researchers from 17 countries and a broad range of academic institutions, national laboratories and industrial organizations come together in this volume to report on the status of key areas and recent discoveries. More specifically, the volume is organized into five sections. The first four highlight ongoing work primarily in the area of amorphous/nanocrystalline (disordered) carbon thin films; theoretical and experimental structural characterization; electrical and optical characterizations; growth methods; and cold-cathode electron emission results. The fifth section describes the growth, characterization and application of boron- and carbon-nitride thin films.

Authors:
; ;  [1]
  1. eds.
Publication Date:
OSTI Identifier:
20013767
Report Number(s):
CONF-971201-
ISBN 1-55899-403-3; TRN: US0000923
Resource Type:
Conference
Resource Relation:
Conference: 1997 Materials Research Society Fall Meeting, Boston, MA (US), 12/01/1997--12/05/1997; Other Information: PBD: 1998
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; PROCEEDINGS; THIN FILMS; AMORPHOUS STATE; CARBON; BORON NITRIDES; CARBON NITRIDES; BORON CARBIDES; USES; CRYSTAL STRUCTURE; PHYSICAL PROPERTIES; CRYSTAL GROWTH

Citation Formats

Siegal, M P, Milne, W I, and Jaskie, J E. Covalently bonded disordered thin-film materials. Materials Research Society symposium proceedings Volume 498. United States: N. p., 1998. Web.
Siegal, M P, Milne, W I, & Jaskie, J E. Covalently bonded disordered thin-film materials. Materials Research Society symposium proceedings Volume 498. United States.
Siegal, M P, Milne, W I, and Jaskie, J E. 1998. "Covalently bonded disordered thin-film materials. Materials Research Society symposium proceedings Volume 498". United States.
@article{osti_20013767,
title = {Covalently bonded disordered thin-film materials. Materials Research Society symposium proceedings Volume 498},
author = {Siegal, M P and Milne, W I and Jaskie, J E},
abstractNote = {The current and potential impact of covalently bonded disordered thin films is enormous. These materials are amorphous-to-nanocrystalline structures made from light atomic weight elements from the first row of the periodic table. Examples include amorphous tetrahedral diamond-like carbon, boron nitride, carbon nitride, boron carbide, and boron-carbon-nitride. These materials are under development for use as novel low-power, high-visibility elements in flat-panel display technologies, cold-cathode sources for microsensors and vacuum microelectronics, encapsulants for both environmental protection and microelectronics, optical coatings for laser windows, and ultra-hard tribological coatings. researchers from 17 countries and a broad range of academic institutions, national laboratories and industrial organizations come together in this volume to report on the status of key areas and recent discoveries. More specifically, the volume is organized into five sections. The first four highlight ongoing work primarily in the area of amorphous/nanocrystalline (disordered) carbon thin films; theoretical and experimental structural characterization; electrical and optical characterizations; growth methods; and cold-cathode electron emission results. The fifth section describes the growth, characterization and application of boron- and carbon-nitride thin films.},
doi = {},
url = {https://www.osti.gov/biblio/20013767}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Jul 01 00:00:00 EDT 1998},
month = {Wed Jul 01 00:00:00 EDT 1998}
}

Conference:
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