Kinetic two-dimensional modeling of inductively coupled plasmas based on a hybrid kinetic approach
In recent years the design cycle for semiconductor manufacturing equipment has shortened to about 18 months. The ever shorter period of development and the need for cost-effective design of new plasma processing tools has created demand for efficient, engineering-type plasma modeling. In this paper, the authors present a two-dimensional (2-D) kinetic model for low-pressure inductively coupled discharges. The kinetic treatment of the plasma electrons is based on a hybrid kinetic scheme in which the range of electron energies is divided into two subdomains. In the low energy range the electron distribution function is determined from the traditional nonlocal approximation. In the high energy part the complete spatially dependent Boltzmann equation is solved. The scheme provides computational efficiency and enables inclusion of electron-electron collisions which are important in low-pressure high-density plasmas. The self-consistent scheme is complemented by a 2-D fluid model for the ions and the solution of the complex wave equation for the RF electric field. Results of this model are compared to experimental results. Good agreement in terms of plasma density and potential profiles is observed. In particular, the model is capable of reproducing the transition from on-axis to off-axis peaked density profiles as observed in experiments which underlines the significant improvements compared to models purely based on the traditional nonlocal approximation.
- Research Organization:
- Univ. of Minnesota, Minneapolis, MN (US)
- OSTI ID:
- 20005561
- Journal Information:
- IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers), Vol. 27, Issue 5; Other Information: PBD: Oct 1999; ISSN 0093-3813
- Country of Publication:
- United States
- Language:
- English
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