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Title: Supercritical CO{sub 2} fluid for chip resistor cleaning

Abstract

The cleaning ability of supercritical CO{sub 2} was examined on chip resistors. Extraction analyses were made by atomic absorption spectroscopy and the extent of surface cleaning observed by scanning electron microscopy. Experimental results showed that the flow-cleaning process of supercritical CO{sub 2} possessed the advantages of having a superior cleaning ability and permitting a nondrying step. These characteristics strongly suggest that supercritical CO{sub 2} is a superior alternative to the traditional deionized water used in rinsing chip resistors. Moreover, a higher pressure and temperature can benefit the cleaning ability of this novel supercritical CO{sub 2} cleaning technique.

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
I-Shou Univ., Kaohsiung (TW)
OSTI Identifier:
20003181
Resource Type:
Journal Article
Journal Name:
Journal of the Electrochemical Society
Additional Journal Information:
Journal Volume: 146; Journal Issue: 9; Other Information: PBD: Sep 1999
Country of Publication:
United States
Language:
English
Subject:
32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; RESISTORS; CLEANING; CARBON DIOXIDE; SUPERCRITICAL STATE; MATERIAL SUBSTITUTION

Citation Formats

Wang, C.W., Chang, R.T., Lin, W.K., Lin, R.D., Liang, M.T., Yang, J.F., and Wang, J.B. Supercritical CO{sub 2} fluid for chip resistor cleaning. United States: N. p., 1999. Web. doi:10.1149/1.1392501.
Wang, C.W., Chang, R.T., Lin, W.K., Lin, R.D., Liang, M.T., Yang, J.F., & Wang, J.B. Supercritical CO{sub 2} fluid for chip resistor cleaning. United States. doi:10.1149/1.1392501.
Wang, C.W., Chang, R.T., Lin, W.K., Lin, R.D., Liang, M.T., Yang, J.F., and Wang, J.B. Wed . "Supercritical CO{sub 2} fluid for chip resistor cleaning". United States. doi:10.1149/1.1392501.
@article{osti_20003181,
title = {Supercritical CO{sub 2} fluid for chip resistor cleaning},
author = {Wang, C.W. and Chang, R.T. and Lin, W.K. and Lin, R.D. and Liang, M.T. and Yang, J.F. and Wang, J.B.},
abstractNote = {The cleaning ability of supercritical CO{sub 2} was examined on chip resistors. Extraction analyses were made by atomic absorption spectroscopy and the extent of surface cleaning observed by scanning electron microscopy. Experimental results showed that the flow-cleaning process of supercritical CO{sub 2} possessed the advantages of having a superior cleaning ability and permitting a nondrying step. These characteristics strongly suggest that supercritical CO{sub 2} is a superior alternative to the traditional deionized water used in rinsing chip resistors. Moreover, a higher pressure and temperature can benefit the cleaning ability of this novel supercritical CO{sub 2} cleaning technique.},
doi = {10.1149/1.1392501},
journal = {Journal of the Electrochemical Society},
number = 9,
volume = 146,
place = {United States},
year = {1999},
month = {9}
}