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Title: Oblique-incidence anisotropy in very thin Ni-Fe films

Abstract

A study was made on the magnetic anisotropy in very thin Ni-Fe films of 10 nm or less sputtered at oblique-incidence. The anisotropy field H{sub k}'s of Ni-Fe films induced on Ta films by oblique-incidence was different from that on Al{sub 2}O{sub 3} films and was reduced with an application of the RF substrate bias while films were being formed. HK's, at oblique-incidence, were dependent on the film structure. The difference in the chain structure of Ni-Fe films is considered to be the cause of difference in H{sub k}.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Sharp Corp., Nara (JP)
OSTI Identifier:
20000788
Resource Type:
Journal Article
Journal Name:
IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers)
Additional Journal Information:
Journal Volume: 35; Journal Issue: 5Pt2; Conference: 1999 international magnetics conference (Intermag '99), Kyongju (KR), 05/18/1999--05/21/1999; Other Information: PBD: Sep 1999; Journal ID: ISSN 0018-9464
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; MAGNETIC PROPERTIES; ANISOTROPY; NICKEL ALLOYS; IRON ALLOYS; THIN FILMS; SUBSTRATES; CRYSTAL STRUCTURE

Citation Formats

Michijima, M., Hayashi, H., Kyoho, M., Nakabayashi, T., Komoda, T., and Kira, T. Oblique-incidence anisotropy in very thin Ni-Fe films. United States: N. p., 1999. Web. doi:10.1109/20.800551.
Michijima, M., Hayashi, H., Kyoho, M., Nakabayashi, T., Komoda, T., & Kira, T. Oblique-incidence anisotropy in very thin Ni-Fe films. United States. doi:10.1109/20.800551.
Michijima, M., Hayashi, H., Kyoho, M., Nakabayashi, T., Komoda, T., and Kira, T. Wed . "Oblique-incidence anisotropy in very thin Ni-Fe films". United States. doi:10.1109/20.800551.
@article{osti_20000788,
title = {Oblique-incidence anisotropy in very thin Ni-Fe films},
author = {Michijima, M. and Hayashi, H. and Kyoho, M. and Nakabayashi, T. and Komoda, T. and Kira, T.},
abstractNote = {A study was made on the magnetic anisotropy in very thin Ni-Fe films of 10 nm or less sputtered at oblique-incidence. The anisotropy field H{sub k}'s of Ni-Fe films induced on Ta films by oblique-incidence was different from that on Al{sub 2}O{sub 3} films and was reduced with an application of the RF substrate bias while films were being formed. HK's, at oblique-incidence, were dependent on the film structure. The difference in the chain structure of Ni-Fe films is considered to be the cause of difference in H{sub k}.},
doi = {10.1109/20.800551},
journal = {IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers)},
issn = {0018-9464},
number = 5Pt2,
volume = 35,
place = {United States},
year = {1999},
month = {9}
}