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Title: Tunneling magnetoresistance effect of granular Co-Ta-O films sputtered under an oblique cathode arrangement

Abstract

Tunneling magnetoresistance of granular Co-Ta-O films sputtered under an obliquely arranged electrodes was investigated as a function of the film thickness and the concentration of Co to Ta{sub 2}O{sub 5}. Formation of micro-scale structures such as corrugated surface elongating perpendicular to the incident ion-beam (thickness < 50 nm) and columnar structure inclined to the normal of the film plane (thickness > 50 nm) were quite similar to vacuum evaporated films. As a result of these structures, the resistivity at zero field {rho}(0) and the resistivity change with field {Delta}{rho} became about 1 order of magnitude larger compared to those of films sputtered under ordinary parallel electrode arrangement.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Toyohashi Univ. of Technology (JP)
OSTI Identifier:
20000666
Resource Type:
Journal Article
Journal Name:
IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers)
Additional Journal Information:
Journal Volume: 35; Journal Issue: 5Pt1; Conference: 1999 international magnetics conference (Intermag '99), Kyongju (KR), 05/18/1999--05/21/1999; Other Information: PBD: Sep 1999; Journal ID: ISSN 0018-9464
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; TUNNEL EFFECT; MAGNETORESISTANCE; TANTALUM OXIDES; COBALT ALLOYS; COMPOSITE MATERIALS; MICROSTRUCTURE; GRANULAR MATERIALS

Citation Formats

Tanaka, Kazato, Yamauchi, Shinya, Makino, Eiji, Fujii, Toshitaka, Inoue, Mitsuteru, and Izaki, Masanobu. Tunneling magnetoresistance effect of granular Co-Ta-O films sputtered under an oblique cathode arrangement. United States: N. p., 1999. Web. doi:10.1109/20.801024.
Tanaka, Kazato, Yamauchi, Shinya, Makino, Eiji, Fujii, Toshitaka, Inoue, Mitsuteru, & Izaki, Masanobu. Tunneling magnetoresistance effect of granular Co-Ta-O films sputtered under an oblique cathode arrangement. United States. doi:10.1109/20.801024.
Tanaka, Kazato, Yamauchi, Shinya, Makino, Eiji, Fujii, Toshitaka, Inoue, Mitsuteru, and Izaki, Masanobu. Wed . "Tunneling magnetoresistance effect of granular Co-Ta-O films sputtered under an oblique cathode arrangement". United States. doi:10.1109/20.801024.
@article{osti_20000666,
title = {Tunneling magnetoresistance effect of granular Co-Ta-O films sputtered under an oblique cathode arrangement},
author = {Tanaka, Kazato and Yamauchi, Shinya and Makino, Eiji and Fujii, Toshitaka and Inoue, Mitsuteru and Izaki, Masanobu},
abstractNote = {Tunneling magnetoresistance of granular Co-Ta-O films sputtered under an obliquely arranged electrodes was investigated as a function of the film thickness and the concentration of Co to Ta{sub 2}O{sub 5}. Formation of micro-scale structures such as corrugated surface elongating perpendicular to the incident ion-beam (thickness < 50 nm) and columnar structure inclined to the normal of the film plane (thickness > 50 nm) were quite similar to vacuum evaporated films. As a result of these structures, the resistivity at zero field {rho}(0) and the resistivity change with field {Delta}{rho} became about 1 order of magnitude larger compared to those of films sputtered under ordinary parallel electrode arrangement.},
doi = {10.1109/20.801024},
journal = {IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers)},
issn = {0018-9464},
number = 5Pt1,
volume = 35,
place = {United States},
year = {1999},
month = {9}
}