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Title: Surface cleaning and adsorbate layer formation: Dual role of alkylamines in the formation of self-assembled monolayers on cuprate superconductors

Abstract

The development of monolayer adsorption chemistry for superconductor surfaces is particularly important for a number of practical and fundamental reasons. As high-T{sub c} superconductors begin to approach the marketplace in areas of communications, power industries, medical applications, and scientific instrumentation, the development of new soft chemistry approaches for the surface modification of these technologically relevant electronic materials becomes increasingly important. Monolayer adsorption chemistry has been developed extensively for electronic materials such as metals, semiconductors, and insulators. These methodologies have been expanded recently to include a variety of high-temperature superconductors (HTSCs). The authors describe a series of new X-ray photoelectron spectroscopy (XPS), four-point conductivity, critical current, atomic absorption spectroscopy (AAS), grazing angle infrared spectroscopy, and GE--MS experiments, which lead the suggestion that an entirely different mechanism is involved in the formation of HTSC-localized monolayers. According to the new model, the amine reagents serve two chemically distinct roles. In the initial phase, the degraded superconductor exteriors is etched away with the help of the amine compounds. The etching process proceeds to the point where fresh YBa{sub 2}Cu{sub 3}O{sub 7} is exposed, and only at this point do the amines adsorb and remain at the YBa{sub 2}Cu{sub 3}O{sub 7} surface. As the adsorptionmore » process continues, there is an accumulation of an organized monolayer at the surface, which prevents further etching of the YBa{sub 2}Cu{sub 3}O{sub 7} material.« less

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Univ. of Texas, Austin, TX (US)
Sponsoring Org.:
US Department of the Air Force; National Science Foundation (NSF); US Department of the Navy, Office of Naval Research (ONR)
OSTI Identifier:
20000038
Resource Type:
Journal Article
Journal Name:
Journal of the American Chemical Society
Additional Journal Information:
Journal Volume: 121; Journal Issue: 32; Other Information: PBD: 18 Aug 1999; Journal ID: ISSN 0002-7863
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; HIGH-TC SUPERCONDUCTORS; SURFACE CLEANING; CHEMICAL REACTION KINETICS; AMINES; SURFACE COATING; YTTRIUM OXIDES; COPPER OXIDES; BARIUM OXIDES; SURFACE PROPERTIES

Citation Formats

Ritchie, J.E., Murray, W.R., Kershan, K., Diaz, V., Tran, L., and McDevitt, J.T. Surface cleaning and adsorbate layer formation: Dual role of alkylamines in the formation of self-assembled monolayers on cuprate superconductors. United States: N. p., 1999. Web. doi:10.1021/ja991165e.
Ritchie, J.E., Murray, W.R., Kershan, K., Diaz, V., Tran, L., & McDevitt, J.T. Surface cleaning and adsorbate layer formation: Dual role of alkylamines in the formation of self-assembled monolayers on cuprate superconductors. United States. doi:10.1021/ja991165e.
Ritchie, J.E., Murray, W.R., Kershan, K., Diaz, V., Tran, L., and McDevitt, J.T. Wed . "Surface cleaning and adsorbate layer formation: Dual role of alkylamines in the formation of self-assembled monolayers on cuprate superconductors". United States. doi:10.1021/ja991165e.
@article{osti_20000038,
title = {Surface cleaning and adsorbate layer formation: Dual role of alkylamines in the formation of self-assembled monolayers on cuprate superconductors},
author = {Ritchie, J.E. and Murray, W.R. and Kershan, K. and Diaz, V. and Tran, L. and McDevitt, J.T.},
abstractNote = {The development of monolayer adsorption chemistry for superconductor surfaces is particularly important for a number of practical and fundamental reasons. As high-T{sub c} superconductors begin to approach the marketplace in areas of communications, power industries, medical applications, and scientific instrumentation, the development of new soft chemistry approaches for the surface modification of these technologically relevant electronic materials becomes increasingly important. Monolayer adsorption chemistry has been developed extensively for electronic materials such as metals, semiconductors, and insulators. These methodologies have been expanded recently to include a variety of high-temperature superconductors (HTSCs). The authors describe a series of new X-ray photoelectron spectroscopy (XPS), four-point conductivity, critical current, atomic absorption spectroscopy (AAS), grazing angle infrared spectroscopy, and GE--MS experiments, which lead the suggestion that an entirely different mechanism is involved in the formation of HTSC-localized monolayers. According to the new model, the amine reagents serve two chemically distinct roles. In the initial phase, the degraded superconductor exteriors is etched away with the help of the amine compounds. The etching process proceeds to the point where fresh YBa{sub 2}Cu{sub 3}O{sub 7} is exposed, and only at this point do the amines adsorb and remain at the YBa{sub 2}Cu{sub 3}O{sub 7} surface. As the adsorption process continues, there is an accumulation of an organized monolayer at the surface, which prevents further etching of the YBa{sub 2}Cu{sub 3}O{sub 7} material.},
doi = {10.1021/ja991165e},
journal = {Journal of the American Chemical Society},
issn = {0002-7863},
number = 32,
volume = 121,
place = {United States},
year = {1999},
month = {8}
}