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Enhancement Mode β-(Al x Ga 1-x ) 2 O 3 /Ga 2 O 3 Heterostructure FET (HFET) With High Transconductance and Cutoff Frequency

Journal Article · · IEEE Electron Device Letters

Not provided.

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials (CFN)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
SC0012704
OSTI ID:
1982874
Journal Information:
IEEE Electron Device Letters, Vol. 42, Issue 10; ISSN 0741-3106
Publisher:
IEEE
Country of Publication:
United States
Language:
English

References (24)

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Modulation-doped β-(Al 0.2 Ga 0.8 ) 2 O 3 /Ga 2 O 3 field-effect transistor July 2017
Growth and characterization of metalorganic vapor-phase epitaxy-grown β -(Al x Ga 1− x ) 2 O 3 / β -Ga 2 O 3 heterostructure channels January 2021
High electron density β -(Al 0.17 Ga 0.83 ) 2 O 3 /Ga 2 O 3 modulation doping using an ultra-thin (1 nm) spacer layer June 2020
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β-(Al 0.18 Ga 0.82 ) 2 O 3 /Ga 2 O 3 Double Heterojunction Transistor With Average Field of 5.5 MV/cm June 2021
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Structural, band and electrical characterization of β-(Al 0.19 Ga 0.81 ) 2 O 3 films grown by molecular beam epitaxy on Sn doped β-Ga 2 O 3 substrate September 2019
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130 mA mm−1 β-Ga2O3 metal semiconductor field effect transistor with low-temperature metalorganic vapor phase epitaxy-regrown ohmic contacts June 2021

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