Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium–Zirconium Oxide-Based Metal–Oxide–Semiconductor Structures

Tasneem, Nujhat; Kashyap, Harshil; Chae, Kisung; Park, Chinsung; Lee, Ping-che; Lombardo, Sarah F.; Afroze, Nashrah; Tian, Mengkun; Kumarasubramanian, Harish; Hur, Jae; Chen, Hang; Chern, Winston; Yu, Shimeng; Bandaru, Prabhakar; Ravichandran, Jayakanth; Cho, Kyeongjae; Kacher, Josh; Kummel, Andrew C.; Khan, Asif Islam

doi:10.1021/acsami.2c11736

Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium–Zirconium Oxide-Based Metal–Oxide–Semiconductor Structures

Journal Article · 19 September 2022 · ACS Applied Materials and Interfaces

DOI:https://doi.org/10.1021/acsami.2c11736· OSTI ID:1981999

Tasneem, Nujhat ^[1]; ^[2]; Chae, Kisung ^[3]; Park, Chinsung ^[1]; Lee, Ping-che ^[2]; Lombardo, Sarah F. ^[4]; Afroze, Nashrah ^[1]; ^[1]; Kumarasubramanian, Harish ^[5]; Hur, Jae ^[1]; Chen, Hang ^[1]; Chern, Winston ^[1]; Yu, Shimeng ^[1]; ^[6]; Ravichandran, Jayakanth ^[7]; ^[8]; Kacher, Josh ^[4]; ^[2]; Khan, Asif Islam ^[9]

School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States
Department of Chemistry and BioChemistry, University of California, San Diego, La Jolla, California 92093, United States
Department of Chemistry and BioChemistry, University of California, San Diego, La Jolla, California 92093, United States; Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, Texas 75080, United States
School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States
Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089, United States
Department of Materials Science and Engineering, University of California, San Diego, La Jolla, California 92093, United States
Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089, United States; Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles 90089, United States
Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, Texas 75080, United States
School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States; School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States

Not provided.

Research Organization:: SLAC National Accelerator Laboratory, Menlo Park, CA (United States). Stanford Synchrotron Radiation Lightsource (SSRL)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC02-76SF00515

OSTI ID:: 1981999

Journal Information:: ACS Applied Materials and Interfaces, Journal Name: ACS Applied Materials and Interfaces Journal Issue: 38 Vol. 14; ISSN 1944-8244

Publisher:: American Chemical Society (ACS)

Country of Publication:: United States

Language:: English

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