Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides

Poddar, Preeti K.; Zhong, Yu; Mannix, Andrew J.; Mujid, Fauzia; Yu, Jaehyung; Liang, Ce; Kang, Jong-Hoon; Lee, Myungjae; Xie, Saien; Park, Jiwoong

doi:10.1021/acs.nanolett.1c04081

Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides

Journal Article · 10 January 2022 · Nano Letters

DOI:https://doi.org/10.1021/acs.nanolett.1c04081· OSTI ID:1981958

^[1]; Zhong, Yu ^[1]; ^[2]; Mujid, Fauzia ^[1]; Yu, Jaehyung ^[1]; Liang, Ce ^[3]; ^[1]; Lee, Myungjae ^[2]; Xie, Saien ^[3]; Park, Jiwoong ^[4]

Department of Chemistry, University of Chicago, Chicago, Illinois 60637, United States
James Franck Institute, University of Chicago, Chicago, Illinois 60637, United States
Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States
Department of Chemistry, University of Chicago, Chicago, Illinois 60637, United States; James Franck Institute, University of Chicago, Chicago, Illinois 60637, United States; Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States

Not provided.

Research Organization:: Energy Frontier Research Centers (EFRC) (United States). Center for Novel Pathways to Quantum Coherence in Materials (NPQC)

Sponsoring Organization:: USDOE

OSTI ID:: 1981958

Journal Information:: Nano Letters, Vol. 22, Issue 2; ISSN 1530-6984

Publisher:: American Chemical Society

Country of Publication:: United States

Language:: English

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