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Enhanced Hole Transport in Ni/Y₂O₃/n-4H-SiC MOS for Self-Biased Radiation Detection

Journal Article · · IEEE Electron Device Letters
 [1];  [2];  [2];  [2];  [3];  [3];  [2]
  1. Department of Electrical Engineering, University of South Carolina, Columbia, SC, USA; OSTI
  2. Department of Electrical Engineering, University of South Carolina, Columbia, SC, USA
  3. Department of Mechanical Engineering, University of South Carolina, Columbia, SC, USA
Not provided.
Research Organization:
Univ. of South Carolina, Columbia, SC (United States); UT-Battelle LLC/ORNL, Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Nuclear Energy (NE)
DOE Contract Number:
NE0008662; AC07-05ID14517
OSTI ID:
1980441
Journal Information:
IEEE Electron Device Letters, Journal Name: IEEE Electron Device Letters Journal Issue: 9 Vol. 43; ISSN 0741-3106
Publisher:
IEEE
Country of Publication:
United States
Language:
English

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