In Situ Studies of Single-Nanoparticle-Level Nickel Thermal Oxidation: From Early Oxide Nucleation to Diffusion-Balanced Oxide Thickening

Sainju, Rajat; Rathnayake, Dinithi; Tan, Haiyan; Bollas, George; Dongare, Avinash M.; Suib, Steven L.; Zhu, Yuanyuan

doi:10.1021/acsnano.2c00742

In Situ Studies of Single-Nanoparticle-Level Nickel Thermal Oxidation: From Early Oxide Nucleation to Diffusion-Balanced Oxide Thickening

Journal Article · 12 April 2022 · ACS Nano

DOI:https://doi.org/10.1021/acsnano.2c00742· OSTI ID:1978389

Sainju, Rajat; Rathnayake, Dinithi; Tan, Haiyan; ; ; ;

Not provided.

Research Organization:: Univ. of Connecticut, Storrs, CT (United States); Univ. of California, Oakland, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

DOE Contract Number:: FG02-86ER13622; AC02-05CH11231

OSTI ID:: 1978389

Journal Information:: ACS Nano, Vol. 16, Issue 4; ISSN 1936-0851

Publisher:: American Chemical Society (ACS)

Country of Publication:: United States

Language:: English

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