Determination of the temperature dependence of the penetration depth of Nb in Nb/AlO{sub x}/Nb Josephson junctions from a resistive measurement in a magnetic field

Technical Report · Mon Nov 01 00:00:00 EST 1993

DOI:https://doi.org/10.2172/195746· OSTI ID:195746

Kim, D H ^[1]; Gray, K E; Hettinger, J D ^[2]; Kang, J H ^[3]

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1. Korea Inst. of Science and Technology, Seoul (Korea, Republic of)
2. Argonne National Lab., IL (United States). Materials Science Div.
3. Westinghouse Science and Technology Center, Pittsburgh, PA (United States)

The temperature dependence of the penetration depth of Nb films was determined from resistive transitions of Nb/AlO{sub x}/Nb Josephson junctions in a constant magnetic field applied parallel to the junction planes. Distinct resistance peaks were observed as temperature decreases and those peaks were found to appear when the total flux threading the junction equals an integral multiple of the flux quantum. From this condition, the authors have determined the penetration depth at those peak positions. The temperature dependence was well described by the either dirty local limit or the two-fluid model. This method can be useful for highly fluctuating system like high-temperature superconductors.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States); National Science Foundation, Washington, DC (United States); Korean Ministry of Science and Technology (Korea, Republic of)
• DOE Contract Number: W-31109-ENG-38
• OSTI ID: 195746
• Report Number(s): ANL/MSD/PP-81462; ON: DE96006949; TRN: AHC29605%%123
• Resource Relation: Other Information: PBD: Nov 1993
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
66 PHYSICS
JOSEPHSON JUNCTIONS
ELECTRIC CONDUCTIVITY
NIOBIUM
PENETRATION DEPTH
ALUMINIUM OXIDES
HIGH-TC SUPERCONDUCTORS
CRITICAL CURRENT
EXPERIMENTAL DATA
MATHEMATICAL MODELS
DIAGNOSTIC TECHNIQUES
CRITICAL FIELD