Deposition of dielectric and metallic materials on thin silver films: In-situ measurement of reflectance and DC-resistance changes
- Ludwig-Maximilians-Univ. Muenchen (Germany). Sektion Physik
Multilayer systems of thin silver films and dielectric layers are used for example in low-e windows. The optical properties of the silver films differ markedly from the optical,properties of bulk silver and are influenced by the deposition of the top dielectric layer. Recently, the authors presented a dual-ion-beam sputtering apparatus with in-situ monitoring of reflectance and dc-resistance. The dielectric, Si{sub 3}N{sub 4}, was produced by sputtering silicon and assisting with an energetic nitrogen beam (200 eV). A sharp reduction in reflectance and a corresponding increase in dc-resistance of the silver film was observed during the first stage of the deposition. It was speculated that a thickness reduction of the silver film due to sputtering by the energetic nitrogen ions might cause some of the changes. In the present paper, the authors report measurements of film thicknesses by grazing incidence x-ray reflectometry (GIXR), which allow to exclude thickness reduction. They show that the optical absorptance of the sandwich system increases during deposition of the to-dielectric layer. Different elements (Al, Si, Ta, and Ti) were sputtered onto the silver film without assisting, causing similar changes as dual-ion-beam sputtered Si{sub 3}N{sub 4}. Furthermore, Si{sub 3}N{sub 4} was sputtered directly from a dielectric target. In contrast to the other materials, the authors observed only small changes in reflectance and dc-resistance.
- OSTI ID:
- 194849
- Report Number(s):
- CONF-9404167-; ISBN 0-8194-1564-2; TRN: IM9611%%351
- Resource Relation:
- Conference: SPIE 13: international symposium on optical materials technology for energy efficiency and solar energy conversion, Freiburg (Germany), 18-22 Apr 1994; Other Information: PBD: 1994; Related Information: Is Part Of Optical materials technology for energy efficiency and solar energy conversion XIII; Wittwer, V. [ed.] [Fraunhofer Inst. for Solar Energy Systems, Freiburg (Germany)]; Granqvist, C.G. [ed.] [Uppsala Univ. (Sweden). Dept. of Technology]; Lampert, C. [ed.] [Lawrence Berkeley Lab., Berkeley, CA (United States). Energy and Environment Div.]; PB: 863 p.; Proceedings/SPIE, Volume 2255
- Country of Publication:
- United States
- Language:
- English
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